Advanced optical lithography development, from UV to EUV

Fay, B.

doi:10.1016/s0167-9317(02)00427-6

Cited by 58 publications

(30 citation statements)

References 4 publications

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“…The total spectral range must be optimized to accurate describing of the radiation energy redistribution using reasonable computational capability. As practice calculations show, MHD results have an acceptable error by the total number of spectral ranges about ~10 3 . These opacities will be inapplicable for detailed investigations in spectral band of plasma focus devices 13.5±2% nm.…”

Section: Integration By Anglesmentioning

confidence: 94%

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Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

Sizyuk¹,

Hassanein²,

Morozov³

et al. 2007

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Section: Integration By Anglesmentioning

confidence: 94%

“…(2) minimal component size can be achieved by increasing the numerical aperture or decreasing the wavelength or k-factor. Until about 1993-1994, k was stable at 0.8; it has since been decreased to almost 0.4 by using binary masks [3]. As illustrated in Table 1, there has been a continuous increase in NA and decrease in wavelength over the years.…”

Section: Cementioning

confidence: 99%

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

Sizyuk¹,

Hassanein²,

Morozov³

et al. 2007

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“…This has been effectively applied to the transition of irradiation technology from g-line (436 nm) [1][2][3] to i-line (365 nm) 4 -6 and has pushed the resolution limits of conventional near-UV irradiation technology [7][8][9] to Ͻ0.30 m. With the need to produce even smaller features, shorter wavelength radiation, such as deep ultraviolet (DUV) radiation (150 -320 nm), 10 -12 has been employed. Photons generated from DUV radiation exhibit higher energy than those generated from near UV radiation sources.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

Liu

Hsieh

Tseng

2005

J of Applied Polymer Sci

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ABSTRACT:To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-1,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists.

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“…[9,10] In previous studies, metallic microstructures were usually fabricated by photolithography, which was time-consuming and costly. [11] Template-assisted electrodeposition is an easy way to fabricate microstructures. For example, anodic aluminum oxide (AAO) [12][13][14] and polymeric membranes [15] have been used as molds, and the size of the channels in these systems can reach a few nanometers.…”

mentioning

confidence: 99%

Creating In‐Plane Metallic‐Nanowire Arrays by Corner‐Mediated Electrodeposition

et al. 2009

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Metallic microstructures are the essential building blocks in microelectronics as electric interconnection between different functioning parts. [1] In the blooming field of optoelectronics, metallic microstructures also play a key role due to surfaceplasmon-plariton-related effects, [2,3] applications in miniaturization of photonic circuits, [4,5] near-field optics, [6] and singlemolecule optical sensing. [7,8] The electromagnetic resonance in metallic microstructures may offer unique properties that do not exist in natural materials, such as negative refractive index. [9,10] In previous studies, metallic microstructures were usually fabricated by photolithography, which was time-consuming and costly. [11] Template-assisted electrodeposition is an easy way to fabricate microstructures. For example, anodic aluminum oxide (AAO) [12][13][14] and polymeric membranes [15] have been used as molds, and the size of the channels in these systems can reach a few nanometers.[16] However, the destructivity in removal template renders it difficult to preserve the spatial order among the nanowires, [17,18] hence limits their applications in optoelectronics. We once introduced a selective electrodeposition method to fabricate two-dimensional metallic structures, where the substrate surface was modified by stripes of lipid monolayers, on which nucleation of metal crystallites was easier.[19] However, in that case the width of the metallic wires was limited by the geometrical shape of templates, that is, the width of metallic wires could not be tuned unless a new template was used. Furthermore, previously fabricated wires [19] were essentially flat belts lying on the substrate, which would not be effective if applied to sensors where a large specific surface area is usually expected. [20] Therefore, one of the important challenges in fabricating metallic microstructures is to find an easy, repeatable, and controllable method to meet the increasing demands in optoelectronics and plasmonics.In this communication, we report a new template-assisted electrochemical approach to fabricate arrays of metallic nanowires. Unlike conventional template-assisted growth, where the generated wires are confined by the size of template, in our case the width of the metallic wires can be tuned by changing the control parameters of electrodeposition. By imprinting polymer stripes on a silicon surface, the concave corner of polymer stripes and silicon substrate provides a preferential nucleation site for the formation of metal nanowires. The width of wires can be tuned from 25 nm to a few hundred nanometers. Further, we demonstrate that this method can be applied for fabricating more complicated structures rather than straight lines only.In our experiments, the metallic nanowires are electrodeposited with the help of polymer stripes embossed on silicon surfaces. To form the patterned substrate, a thin film of poly(methylmethacrylate) (PMMA) (mr-I 7030E M w ¼ 75 kDa) is initially spin-coated on the silicon wafer. The film thickness is about 300 nm. Th...

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Advanced optical lithography development, from UV to EUV

Cited by 58 publications

References 4 publications

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

Creating In‐Plane Metallic‐Nanowire Arrays by Corner‐Mediated Electrodeposition

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