2010
DOI: 10.1117/12.864532
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Advanced photomask cleaning for 32nm and beyond

Abstract: High PRE (Particle removal efficiency) and damage free cleaning became main cleaning challenges over haze prevention in photomask industry, nowadays. SRAF (Sub-resolution assist feature) size became small down below 0.1um as pattern size become small. Acoustic frequency and power is the main parameter to increase PRE in photomask cleaning. 1 MHz of acoustic frequency was good enough to remove particles and soft defects until recently. But it has shown pattern damages for SB (Scattering bar) size of below 0.1um… Show more

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