Advanced technologies for the fabrication of MOF thin films

Crivello, Chiara; Sevim, Semih; Graniel, Octavio; Franco, Carlos; Pané, Salvador; Puigmartí‐Luis, Josep; Muñoz‐Rojas, David

doi:10.1039/d0mh00898b

Cited by 99 publications

(64 citation statements)

References 67 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…As already emphasized in previous sections of this review, one of the recent hot topics in the field of porous MOF materials has been their fabrication in high-quality thin-film form using advanced vapor-phase thin-film techniques. [11,61,117,441] Since the ALD/MLD technique provides us an elegant way to deposit metal-organic materials directly from gaseous precursors, it should in principle be an excellent approach to MOF thin films as well. However, among the in situ crystalline ALD/MLD metal-organic films grown so far, only few cases are potential candidates for porous MOF films: i) copper 1,4-benzenedicarboxylate (Cu-BDC) films, [437] ii) Zr-2-amino-1,4-BDC films, [224] and iii) Fe-BDC films.…”

Section: Prediction Of Ald-/mld-feasible Porous Metal-organic Materialsmentioning

confidence: 99%

“…Indeed, among the different thin-film deposition approaches, the vapor phase deposition techniques including the ALD/MLD technique are the most desirable ones. [11] Moreover, many of the metal-organic materials grown through different ALD/MLD processes are fundamentally new materials; in the most attractive case, this approach allows even materials not accessible by conventional synthesis techniques. Hence, the ALD/MLD fabrication is likely to lead us to truly unique materials allowing the ingenious fusion of metal and organic moieties in such a way that the hybrid material may show even mutually contradictory combinations of properties, in other words, "make impossible possible."…”

Section: Highlights Of Properties/application Potential Of Ald/mld Th...mentioning

confidence: 99%

“…[ 8 ] Traditionally, solvent‐based processes such as liquid‐phase epitaxy, Langmuir–Blodgett, layer‐by‐layer, and electrochemical deposition techniques have been used for metal–organic thin films. [ 9–11 ] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high‐aspect‐ratio features.…”

Section: Introduction To Metal–organic Materials and Combined Atomic ...mentioning

confidence: 99%

See 2 more Smart Citations

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

View full text Add to dashboard Cite

organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

show abstract

Section: Prediction Of Ald-/mld-feasible Porous Metal-organic Materialsmentioning

confidence: 99%

Section: Highlights Of Properties/application Potential Of Ald/mld Th...mentioning

confidence: 99%

Section: Introduction To Metal–organic Materials and Combined Atomic ...mentioning

confidence: 99%

See 1 more Smart Citation

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

View full text Add to dashboard Cite

show abstract

“…[61,62] In addition to the operation characteristics of MOFs as active elements of the memory devices (Table 2), their production should be integrated with existing industrial approaches such as thin-film synthesis and vapor deposition. From this point of view, MOFs are showing colossal progress, expanding the possibilities of their "green" synthesis all the way to mass [97] and large-scale fabrication by spin coating approaches [98] and chemical vapor deposition. [99] However, the existing problem of reducing the roughness of MOF layers to ensure the required surface evenness (less than 1 nm) for the deposition of upper layers by atomic layer and chemical vapor deposition should be overcome.…”

Section: What's New?mentioning

confidence: 99%

MOF‐Based Sustainable Memory Devices

Kulachenkov

Haar

Шипиловских

et al. 2021

Adv Funct Materials

View full text Add to dashboard Cite

Data storage, processing, and communications are the backbone of the digital world and focus the innovation efforts of the microelectronics industry. Recent raw material shortages, however, have revealed the danger of sourcing for the digital industry. At a time of a significant increase in demand for data storage systems, it is urgent to consider the sustainability of the resources used for devices. By diluting inorganic elements in an organic matrix, metal-organic frameworks (MOFs) are of substantial interest for sustainable technologies. Moreover, they have shown great potential as active materials for electronic, optical, and magnetic memory devices, paving the way to accessible, sustainable, and recyclable microelectronic devices. Based on the number of fundamental studies of the bistability of MOFs, their scalability, recyclability, and low energy consumption, MOFs are highlighted as sustainable materials for a new generation of memristive devices. Finally, considering the "green" chemistry of specific MOF, their flexibility, as well as the market of microelectronics and mineral consumption, the future development of MOF-based memory devices and socio-economic profits from their utilization is predicted.

show abstract

“…15 Thereby, MOF lms composed of 2D sheets (2D MOF) and coordinatively connected 2D sheets by pillar molecules (3D MOFs) with a multitude of different organic and metallic building blocks have been obtained. [16][17][18] Although, this method allows to control the orientation of the lattice plane parallel to the substrate (out-of-plane orientation) by changing the terminated functional group of the SAM, these MOF lms lack in-plane orientation. 19 Recently, our group reported a synthetic method to obtain threedimensionally oriented 2D and 3D Cu-based MOF lms by epitaxial growth on copper hydroxide, 20,21 yielding large scale lms with controlled pore alignment.…”

Section: Introductionmentioning

confidence: 99%

Infrared crystallography for framework and linker orientation in metal–organic framework films

et al. 2021

View full text Add to dashboard Cite

show abstract

Advanced technologies for the fabrication of MOF thin films

Abstract: In this Minireview, we discuss several appealing approaches that have been developed in the last few years for the fabrication of MOF thin films, highlighting their assets and the challenges still faced.

Cited by 99 publications

References 67 publications

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

MOF‐Based Sustainable Memory Devices

Infrared crystallography for framework and linker orientation in metal–organic framework films

Contact Info

Product

Resources

About