2009
DOI: 10.1016/j.ultramic.2009.07.005
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Advanced thin film technology for ultrahigh resolution X-ray microscopy

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Cited by 117 publications
(100 citation statements)
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References 21 publications
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“…These imperfections may induce small ring-like artifacts in the RPreconstructed slices that are less evident in PS reconstructions (see SI Text). However, recent improvements in microelectronic engineering resulted in novel methods for manufacturing periodic nanostructures (25,26). With these novel techniques-in particular for large fields of view-a better control on the duty-cycle as well as on the uniformity of the grating can be obtained.…”
Section: Resultsmentioning
confidence: 99%
“…These imperfections may induce small ring-like artifacts in the RPreconstructed slices that are less evident in PS reconstructions (see SI Text). However, recent improvements in microelectronic engineering resulted in novel methods for manufacturing periodic nanostructures (25,26). With these novel techniques-in particular for large fields of view-a better control on the duty-cycle as well as on the uniformity of the grating can be obtained.…”
Section: Resultsmentioning
confidence: 99%
“…When compared with the conventional FZP manufacturing technique, namely the EBL, ML-FZPs present a number of interesting characteristics. Advantages of EBL-FZPs include currently the highest spatial resolutions among point focusing optics [41,61,62] and easy access to larger diameters in general. They are also conveniently fabricated, via well developed schemes, on flat membranes which makes them easier to align.…”
Section: Discussionmentioning
confidence: 99%
“…This alignment process is similar to that described earlier [40]. To determine the resolution, a Siemens star (X30-30-2 Xradia, USA) with specified smallest features of 30 nm, as well as two 500 and 200 nm thick FIB lamellae sliced from a GaAs/Al 0.7 Ga 0.3 As multilayer sample (L200, BAM, Germany) [41] with certified layer thicknesses, were positioned at the 1st order focal plane and raster scanned over the focus. Right behind the test object, an avalanche photodiode (APD, S2382 Hamamatsu, Japan) was employed to collect the total transmitted light at each sample position corresponding to the pixel values of the image.…”
Section: Soft X-ray Range Experimentsmentioning
confidence: 99%
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“…X‐ray microscopy emerged as a very strong tool for natural sciences by providing half‐pitch spatial resolutions of about 10 nm1, 2, 3, 4 and high penetration depths combined with structural, chemical, and magnetic contrast 5, 6, 7. The importance of X‐ray microscopy will grow in the near future owing to exciting developments such as the emergence of next generation synchrotron sources,8, 9, 10 new X‐ray free electron lasers (XFEL), high brilliance laboratory X‐ray sources and high harmonic generation sources providing radiation in the extreme ultraviolet (EUV) regime 11.…”
Section: Introductionmentioning
confidence: 99%