2022
DOI: 10.1002/inf2.12323
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Advanced unconventional techniques for sub‐100 nm nanopatterning

Abstract: Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements. The increasing demand for miniaturization has stimulated the development of sub-100 nm nanopatterning techniques. Beyond conventional lithography-which is limited by unavoidable factors-advanced patterning techniques have been reported to produce nanoscale features down to molecular or even atomic scale. In this review, unconventional techniques for sub-100 nm nanopatterning are … Show more

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Cited by 12 publications
(8 citation statements)
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“…Hence, it is necessary to develop large-area fabrication and mass-production methods to replace their traditional counterparts. Therefore, several alternative techniques [179,[242][243][244], such as two/multi-photon lithography and nanoimprinting lithography (NIL) [245][246][247] have been proposed to address these problems, of which high-precise nanoimprinting can easily transfer predesigned large-scale patterns to the resist layer, as in lithography, with enormous potential for low-cost, large-sized solar concentrator fabrication.…”
Section: Discussionmentioning
confidence: 99%
“…Hence, it is necessary to develop large-area fabrication and mass-production methods to replace their traditional counterparts. Therefore, several alternative techniques [179,[242][243][244], such as two/multi-photon lithography and nanoimprinting lithography (NIL) [245][246][247] have been proposed to address these problems, of which high-precise nanoimprinting can easily transfer predesigned large-scale patterns to the resist layer, as in lithography, with enormous potential for low-cost, large-sized solar concentrator fabrication.…”
Section: Discussionmentioning
confidence: 99%
“…The feature size, and therefore the resolution of the patterning, depends on the surface pattern of the mold. Such molds can be produced either by direct patterning of rigid materials, such as silicon or quartz, via electron-beam-or ion-beam-lithography, or via indirect patterning by double replication of hard masters, using heat-softened materials [40].…”
Section: Nanoimprint Lithography (Nil)mentioning
confidence: 99%
“…In addition to superconductors, fabricating nanoholes offers great potential to modulate other quantum materials. As the progress of sub-100 nm nanopatterning techniques, [461] especially when the hole period further reduces below 40 nm, the periodic hole array begins to change the band structure of the graphene via quantum confinement. [462,463] As the regular periodic array turns into a conformal hole array, the induced gradient distribution significantly breaks in-plane inversion symmetry, which results in a giant superconducting diode effect in the amorphous MoGe films.…”
Section: Top-down Routementioning
confidence: 99%