Advancements And Applications of Finfet Technology in Modern Semiconductor Engineering

Abstract

This comprehensive study presents an in-depth analysis of Fin Field-Effect Transistor (FinFET) technology, a significant innovation in semiconductor technology, focusing on its structural attributes, applications, and future prospects. FinFETs, characterized by their distinctive fin-like channels, are pivotal in overcoming the limitations of traditional MOSFETs, particularly in the context of device miniaturization. The paper begins by exploring the basic theory and structural characteristics of FinFETs, emphasizing their enhanced control over short channel effects and reduced leakage currents in scaled-down devices. Attention is then directed towards the integration of FinFET technology in Static Random-Access Memory (SRAM), detailing how FinFETs contribute to improved stability and efficiency in memory storage. Another crucial application discussed is in the biomedical field, where FinFETs have facilitated the development of advanced instrumentation amplifiers and sensitive sensors, marking a leap in medical electronics. The paper concludes by addressing the challenges encountered by FinFETs as fabrication approaches the 5-7nm scale, including their physical and structural limitations. It also highlights ongoing research in structural modifications and material innovations like Gate-All-Around FETs and alternative materials, underscoring the continued evolution and relevance of FinFET technology in the ever-advancing semiconductor industry.