2000
DOI: 10.1016/s0040-6090(00)00781-1
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Aerosol and plasma assisted chemical vapor deposition process for multi-component oxide La 0.8 Sr 0.2 MnO 3 thin film

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Cited by 19 publications
(16 citation statements)
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“…Chemical methods include sol-gel techniques, 10 metallo-organic decomposition (MOD), 11 and chemical vapor deposition (CVD). 12 Temperatures used in the application of chemical processes are usually lower (400-800 • C) than the ones used in physical methods. Another advantage is that large surface area films can be produced without the need for extra high vacuum environment.…”
Section: Introductionmentioning
confidence: 99%
“…Chemical methods include sol-gel techniques, 10 metallo-organic decomposition (MOD), 11 and chemical vapor deposition (CVD). 12 Temperatures used in the application of chemical processes are usually lower (400-800 • C) than the ones used in physical methods. Another advantage is that large surface area films can be produced without the need for extra high vacuum environment.…”
Section: Introductionmentioning
confidence: 99%
“…In order to obtain thin films from nitrates, extra energy must be introduced to allow diffusion [17]. In this process, glycine is introduced with two purposes.…”
Section: Plasma-aacvdmentioning
confidence: 99%
“…Manganese oxides type perovskite are of scientific interest due to their potential applications in fuel cells and information storage, and to their diverse advantages, such as miniaturization, long life, and low costs [1][2][3][4][5][6][7]. La 0.7 Sr 0.3 MnO 3 (LSMO) is a compound that, given its characteristics, is a good candidate to be used in field magnetic sensors, non-volatile memories, oxygen sensors, and catalysts in the oxidation of light hydrocarbons [7].…”
Section: Introductionmentioning
confidence: 99%