Aerosol deposition-based micropatterning of barium titanate via sulphur hexafluoride inductively coupled plasma etching

Wang, C.; Sung, Ho-Kun; Kim, N.Y.

doi:10.1016/j.vacuum.2014.12.028

Cited by 9 publications

(5 citation statements)

References 19 publications

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“…Additionally, by using SF 6 , more fluoride ions participate in the reaction, creating more by-products. These by-products are then responsible for generating roughness in the polymer surface, because of scattering on the etching surface as a secondary mask 37 , 38 . This effect restricts the use of SF 6 + O 2 as a gaseous mixture for small-angle bevel etching.…”

Section: Resultsmentioning

confidence: 99%

Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications

Sung

Qiang

Yao

et al. 2017

Sci Rep

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This study presents a detailed fabrication method, together with validation, discussion, and analysis, for state-of-the-art silicon carbide (SiC) etching of vertical and bevelled structures by using inductively coupled plasma reactive ion etching (ICP-RIE) for microelectronic applications. Applying different gas mixtures, a maximum bevel angle of 87° (almost vertical), large-angle bevels ranging from 40° to 80°, and small-angel bevels ranging from 7° to 17° were achieved separately using distinct gas mixtures at different ratios. We found that SF6 with additive O2 was effective for vertical etching, with a best etching rate of 3050 Å/min. As for the large-angle bevel structures, BCl3 + N2 gas mixtures show better characteristics, exhibiting a controllable and large etching angle range from 40° to 80° through the adjustment of the mixture ratio. Additionally, a Cl2 + O2 mixture at different ratios is applied to achieve a small-angel bevels ranging from 7° to 17°. A minimum bevel angel of approximately 7° was achieved under the specific volume of 2.4 sccm Cl2 and 3.6 sccm O2. These results can be used to improve performance in various microelectronic applications including MMIC via holes, PIN diodes, Schottky diodes, JFETs’ bevel mesa, and avalanche photodiode fabrication.

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Section: Resultsmentioning

confidence: 99%

Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications

Sung

Qiang

Yao

et al. 2017

Sci Rep

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show abstract

“…Observing in real-time both blending and deposition using x-rays could offer a much deepened understanding of the involved processes [462]. The need for miniaturization can make use of micropatterning due the controllable drop sizes and distribution [463]. Here, the in situ investigation of dynamics in confinement for tailoring functional surface will further be addressed, including the use of pre-patterned substrates and the combination with x-ray nanobeams [375,464,465].…”

Section: Discussionmentioning

confidence: 99%

A deep look into the spray coating process in real-time—the crucial role of x-rays

Roth

2016

J. Phys.: Condens. Matter

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Tailoring functional thin films and coating by rapid solvent-based processes is the basis for the fabrication of large scale high-end applications in nanotechnology. Due to solvent loss of the solution or dispersion inherent in the installation of functional thin films and multilayers the spraying and drying processes are strongly governed by non-equilibrium kinetics, often passing through transient states, until the final structure is installed. Therefore, the challenge is to observe the structural build-up during these coating processes in a spatially and time-resolved manner on multiple time and length scales, from the nanostructure to macroscopic length scales. During installation, the interaction of solid-fluid interfaces and between the different layers, the flow and evaporation themselves determine the structure of the coating. Advanced x-ray scattering methods open a powerful pathway for observing the involved processes in situ, from the spray to the coating, and allow for gaining deep insight in the nanostructuring processes. This review first provides an overview over these rapidly evolving methods, with main focus on functional coatings, organic photovoltaics and organic electronics. Secondly the role and decisive advantage of x-rays is outlined. Thirdly, focusing on spray deposition as a rapidly emerging method, recent advances in investigations of spray deposition of functional materials and devices via advanced x-ray scattering methods are presented.

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“…The proposed structure can be fabricated using the procedures indicated in literature [26,29,[33][34][35]. For example, after the growth (/patterning) of the doped Si-core waveguide, BTO layer can be deposited around the Si-cores using pulsed layer deposition technique [29].…”

Section: Schematic Structure With Proposed Designmentioning

confidence: 99%

“…For example, after the growth (/patterning) of the doped Si-core waveguide, BTO layer can be deposited around the Si-cores using pulsed layer deposition technique [29]. A mask can be used along with a photoresist to etch out the BTO from the sides using inductively coupled plasma (ICP) etching technique leaving BTO cladding only on the top [35]. It may be mentioned here that a slight misalignment of the BTO edge and Si-core edge won't affect the performance reported in this study.…”

Section: Schematic Structure With Proposed Designmentioning

confidence: 99%

A New Approach of Hetero-Cladding for Design of Compact Si Photonic Directional Coupler

Mishra¹,

Das²

2021

Preprint

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In this letter, we propose a new approach of hetero-cladding for realization of compact CMOS compatible silicon photonic directional couplers. The proposed hetero-cladding comprises ferroelectric BaTiO<sub>3</sub> (BTO) and SiO<sub>2</sub> to control the evanescent mode within the structure. The results show very small and identical coupling length for both TE and TM modes with reduced device cross-section, which promises for a huge reduction in the footprint of both conventional and programmable photonic integrated circuits. The concept can also be utilized to design compact, low loss and energy efficient phase shifters, other types of couplers, sensors etc.

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Aerosol deposition-based micropatterning of barium titanate via sulphur hexafluoride inductively coupled plasma etching

Cited by 9 publications

References 19 publications

Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications

Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications

A deep look into the spray coating process in real-time—the crucial role of x-rays

A New Approach of Hetero-Cladding for Design of Compact Si Photonic Directional Coupler

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