AFM and light scattering measurements of optical thin films for applications in the UV spectral region

Jakobs, Stefan; Duparré, Angela; Truckenbrodt, Horst

doi:10.1016/s0890-6955(97)00125-9

Cited by 14 publications

(10 citation statements)

References 6 publications

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“…8. The PSD dependences on frequency are similar to those typically obtained for the samples in which thin layers are deposited on smooth substrate [32][33][34][35]. It was shown in [35] that PSD of a thin film coating can be described by a sum of PSD of the substrate and the PSD of the pure film.…”

Section: Discussionsupporting

confidence: 76%

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Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Bukauskas¹

2008

Lithuanian J. Phys.

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Self-arrangement of DNA based structures on clean mica and modified Si surfaces is investigated by means of scanning probe microscope (SPM) and spectroscopic ellipsometry (SE) method. DNA strands are deposited from a colloidal solution on solid surfaces at room temperature. Surfaces of solid substrates and biomolecular structures are additionally modified by Ag nanoparticles. The self-arranged surface structures are visualized by SPM. The effect of the multicomponent structures on the optical response of complex hybrid structures is studied. Changes in the optical response of the hybrid samples are related to the contributions of self-assembled DNA-based structures and Ag nanoparticles on the Si surfaces. Binding of Ag nanoparticles to the DNA strands and formation of well-ordered structures on the surfaces with DNA are discussed.

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Section: Discussionsupporting

confidence: 76%

“…It was demonstrated in various studies [32][33][34] that some features of the surfaces structures can be described by parameters of the power spectral density (PSD) function derived from the AFM surface profile data.…”

Section: Discussionmentioning

confidence: 99%

Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Bukauskas¹

2008

Lithuanian J. Phys.

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“…AFM and ARS measurements can be compared. 3,5,10 These two techniques permit us to deduce the roughness spectrum in different frequency bandwidths, depending on the sampling rate for AFM measurements and on the wavelength in the case of ARS measurements: In the case of AFM, B͑L͒ ϭ ͓2͞L, N͞L͔ as in Subsection 3.A; in the case of ARS, B͑͒ ϭ ͓2 sin min ͞, 2͔͞, where is the emitted wavelength and min is the minimum scattering angle determined by the mechanical conditions.…”

Section: Comparison Between Atomic Force Microscopy and Angle-resomentioning

confidence: 99%

Optical characterization of an unknown single layer: Institut Fresnel contribution to the Optical Interference Coatings 2004 Topical Meeting Measurement Problem

Lemarchand¹,

Deumié²,

Zerrad³

et al. 2006

Appl. Opt.

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We present the characterizations performed at the Institut Fresnel for the Measurement Problem of the Optical Interference Coatings 2004 Topical Meeting. A single layer coated on a fused-silica substrate of unknown composition and parameters is analyzed in terms of optogeometrical parameters, uniformity, and scattering. We determine the refractive index and the average thickness of the coating, then provide the localized determination of the thickness with a 2 mm spatial resolution. Topography measurements include atomic force microscopy and angle-resolved scattering measurements. These results are completed thanks to a Taylor Hobson noncontact 3D surface profiler.

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“…[4] Another application, a Pt/LaF 3 gas sensor based on Pt and LaF 3 layers acting as the chemically sensitive components, has been used for the detection of fluorine, hydrogen fluoride, fluorocarbons, and oxygen. [14,15] The most often used techniques for depositing LaF 3 thin films have been physical vapor deposition (PVD) methods, e.g., electron-beam evaporation (EBE), [4,11,[16][17][18][19][20][21][22] ion-assisted deposition, [5,7,13,23] thermal evaporation, [3,[6][7][8]12,16,18,[24][25][26][27][28][29][30][31][32][33][34] ionbeam sputtering, [7,18,28] radio frequency magnetron sputtering, [35,36] and molecular beam epitaxy. [37][38][39][40][41] Only a few CVD methods have been used for depositing LaF 3 thin films, i.e., pyrolysis of a single source precursor La(hfa) 3 diglyme complex (hfa ¼ hexafluoroacetylacetonate), [42] or by using HF or...…”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of LaF₃ Thin Films using La(thd)₃ and TiF₄ as Precursors

Pilvi

Puukilainen

Arstila

et al. 2008

Chemical Vapor Deposition

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Lanthanum fluoride is a vacuum ultraviolet (VUV) transparent material which is widely used in optical applications. An atomic layer deposition (ALD) process is developed for depositing lanthanum fluoride thin films for the first time. LaF 3 films are grown at 225-350 -C using La(thd) 3 and TiF 4 as precursors. The crystallinity, morphology, composition, thicknesses, and refractive indices of the films are analyzed by X-ray diffraction/reflection (XRD/XRR), atomic force microscopy (AFM), scanning electron microscopy (SEM), time-of-flight elastic recoil detection analysis (TOF-ERDA), and UV-vis spectrophotometry. Electrical properties, such as permittivity and leakage current density, are also studied. An exceptionally high growth rate of about 5 Å per cycle is achieved at 225-250 -C. The films are polycrystalline, the refractive indices vary between 1.57 and 1.61, and the permittivity is 12.3. The impurities detected in the LaF 3 film are Ti, C, O, and H. The level of all of these tends to decrease with increase in the deposition temperature, and is only 3.5 at.-% at 350 -C.

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AFM and light scattering measurements of optical thin films for applications in the UV spectral region

Cited by 14 publications

References 6 publications

Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Optical characterization of an unknown single layer: Institut Fresnel contribution to the Optical Interference Coatings 2004 Topical Meeting Measurement Problem

Atomic Layer Deposition of LaF₃ Thin Films using La(thd)₃ and TiF₄ as Precursors

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AFM and light scattering measurements of optical thin films for applications in the UV spectral region

Cited by 14 publications

References 6 publications

Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Scanning probe microscopic and optical detection of DNA integration within multicomponent structures on Si surfaces

Optical characterization of an unknown single layer: Institut Fresnel contribution to the Optical Interference Coatings 2004 Topical Meeting Measurement Problem

Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

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Product

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Atomic Layer Deposition of LaF₃ Thin Films using La(thd)₃ and TiF₄ as Precursors