2020
DOI: 10.1016/j.jece.2020.104104
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Ag doped CuO thin film prepared via pulsed laser deposition for 4-nitrophenol degradation

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Cited by 97 publications
(33 citation statements)
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“…This result is also confirmed by other reports from literature where the effect of other background gases was investigated. [ 11,16,18 ] With the increase in the N 2 pressure from 5 × 10 –5 to 10 Pa, we observed a 60% decrease in the expansion velocity of the ions, a 40%–50% increase in electron temperature, and almost one order of magnitude increase in electron density. These changes reveal, in the laser‐produced plasma, a rather complex exchange balance between the kinetic energy and the thermal energy of the ejected particles, with very little contribution from the thermal movement.…”
Section: Resultsmentioning
confidence: 84%
See 1 more Smart Citation
“…This result is also confirmed by other reports from literature where the effect of other background gases was investigated. [ 11,16,18 ] With the increase in the N 2 pressure from 5 × 10 –5 to 10 Pa, we observed a 60% decrease in the expansion velocity of the ions, a 40%–50% increase in electron temperature, and almost one order of magnitude increase in electron density. These changes reveal, in the laser‐produced plasma, a rather complex exchange balance between the kinetic energy and the thermal energy of the ejected particles, with very little contribution from the thermal movement.…”
Section: Resultsmentioning
confidence: 84%
“…[3,4] The development of these types of applications requires a profound comprehension of the fundamental mechanisms involved in plasma plume formation and evolution. For the case of PLD, which has become a widely used technique to produce complex thin films, [1,5,6] for application as sensors, [7,8] catalysis, [9] biocompatible coatings, [9][10][11] the deposition process usually takes place in a reactive gas, which complicates the dynamics of the ablated material. The presence of the background gas is either justified by the chemical balance needed for the production of oxide, nitride, or carbide films or to control the kinetic energy of the ablated particles during the impact with the substrate to avoid defects formation in deposited films.…”
Section: Introductionmentioning
confidence: 99%
“…They are important because they provide the potential for economical processing employing the smallest quantity of raw materials while achieving the application requirements. [ 20–23 ] They have been utilized in various applications, such as antireflective coatings, [ 24 ] air/water filters, [ 25 ] drug delivery, [ 26 ] light‐emitting diodes, [ 27 ] electronic recording devices, [ 28 ] solar cells [ 29 ] and food packaging. [ 30–33 ] Nanocomposite films immobilized with nanomaterials have received great consideration due to their desirable properties, such as optical, [ 34 ] catalytic, [ 35 ] sensory, [ 36,37 ] water‐repellent, [ 38,39 ] antimicrobial, [ 40 ] UV protection, [ 41 ] and electrical conductivity [ 42 ] that make them suitable for various advanced technical applications.…”
Section: Introductionmentioning
confidence: 99%
“…[1] Since then, PLD has been used for oxides, nitrides, carbides and more complex perovskite structures for a wide range of applications, such as solar cells, microelectronics, hard and protective coatings and water splitting. [2][3][4][5][6] Achieving and tailoring the properties of complex films have been proven to be demanding tasks as defects, phase changes and nonstoichiometric transfer can affect thin films. [7] As for all plasma-based technologies, for the PLD technique, the ablated cloud (transient plasma) plays a dual role: one role is related to the deposition process kinetics (energies, excited states and velocities) and the second is related to plasma chemistry (molecular formation, nanoparticle agglomeration or bond dissociations), especially for deposition in reactive gases.…”
Section: Introductionmentioning
confidence: 99%