Scanning tunneling microscopy was used to study the surface morphology changes of the H-terminated Si(1 1 1) surface during Ag deposition at elevated temperatures. Flat H-terminated Si(1 1 1) surfaces were prepared by NH 4 F etching. Domains of various dimer-adatom-stacking-fault superstructures, such as 3 Â 3, 5 Â 5, 7 Â 7, and 9 Â 9 were observed on the Si(1 1 1) surface after hot deposition of 1 ML Ag at 550°C. This phenomenon was compared with hydrogen thermal desorption experiments, which did not show the formation of metastable surface superstructures at temperatures near 550°C. All metastable superstructures obtained after hot Ag deposition at 550°C were found to convert into the 7 Â 7 reconstruction after annealing at 600°C.