2012
DOI: 10.2172/1048520
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Ag on Si(111) from basic science to application

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Cited by 1 publication
(2 citation statements)
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“…Among all metal-passivated Si surfaces, Si(111)-√3×√3-Ag is one of the most studied prototypical metal−semiconductor interfaces. 9 It is formed by deposition of one monolayer of Ag atoms on the Si(111) surface followed by annealing at an elevated temperature. The parabolic surface band structure of Si(111)-√3×√3-Ag near the Fermi level resembles that of a typical metal surface.…”
Section: Introductionmentioning
confidence: 99%
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“…Among all metal-passivated Si surfaces, Si(111)-√3×√3-Ag is one of the most studied prototypical metal−semiconductor interfaces. 9 It is formed by deposition of one monolayer of Ag atoms on the Si(111) surface followed by annealing at an elevated temperature. The parabolic surface band structure of Si(111)-√3×√3-Ag near the Fermi level resembles that of a typical metal surface.…”
Section: Introductionmentioning
confidence: 99%
“…Passivation of Si surfaces with metal atoms offers a promising approach for altering the surface diffusion properties of the adsorbed molecules and hence promoting the formation of the equilibrium state of self-assembled molecular structures. Among all metal-passivated Si surfaces, Si(111)-√3×√3-Ag is one of the most studied prototypical metal–semiconductor interfaces . It is formed by deposition of one monolayer of Ag atoms on the Si(111) surface followed by annealing at an elevated temperature.…”
Section: Introductionmentioning
confidence: 99%