2017
DOI: 10.1021/acs.jpcc.6b11590
|View full text |Cite
|
Sign up to set email alerts
|

Aggregation Behavior of Ligand-Protected Au9 Clusters on Sputtered Atomic Layer Deposition TiO2

Abstract: Au 9 (PPh 3 ) 8 )](NO 3 ) 3 (Au 9 ) clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au 9 clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au 9 clusters due to the annealing process. Both AFM and XPS show that the Au 9 clusters deposited on ALD titania are pa… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
28
0

Year Published

2018
2018
2024
2024

Publication Types

Select...
9

Relationship

7
2

Authors

Journals

citations
Cited by 22 publications
(28 citation statements)
references
References 77 publications
0
28
0
Order By: Relevance
“…TiO 2 is a photocatalytically active substrate 30 and is a common choice as a substrate for the deposition of clusters. 19,20,[31][32][33][34][35][36][37][38][39][40][41][42][43] Here we used RF-deposited TiO 2 as a substrate. It is a nanoparticulate form of TiO 2 made by radio frequency (RF) sputtering a TiO 2 wafer onto a substrate (sputter deposition) under UHV, in the present case Si (100).…”
Section: Introductionmentioning
confidence: 99%
“…TiO 2 is a photocatalytically active substrate 30 and is a common choice as a substrate for the deposition of clusters. 19,20,[31][32][33][34][35][36][37][38][39][40][41][42][43] Here we used RF-deposited TiO 2 as a substrate. It is a nanoparticulate form of TiO 2 made by radio frequency (RF) sputtering a TiO 2 wafer onto a substrate (sputter deposition) under UHV, in the present case Si (100).…”
Section: Introductionmentioning
confidence: 99%
“…However, the deposition energy required for pinning varies depending on the cluster species, cluster size, and support material. A more controllable approach to trapping clusters at local defect sites is to first create defects in a controlled way by sputtering or heating the support, and then follow this with a soft‐landing deposition to exploit the preferential binding of clusters to defect zones . This preferential binding is further discussed in Section .…”
Section: Deposition Methodsmentioning
confidence: 99%
“…Through the XPS final state effect, the size of the phosphine-protected Au 9 clusters can be determined using the Au 4f 7/2 peak position and the FWHM. 23,[53][54][55][56][57] The peak position of phosphine-protected without a CrO x layer. However, more than 80% of the Au 4f intensity for both samples are at the HBP, indicating that most of the Au 9 clusters remain non-agglomerated.…”
Section: Materials Advances Accepted Manuscriptmentioning
confidence: 99%