“…Many techniques have been already employed to grow silica films, including electron beam evaporation, ion-assisted deposition, ion beam sputtering, magnetron sputtering (MS), sol–gel, and atomic layer deposition. − Among all of these techniques, magnetron sputtering (MS) demonstrated the best deposition competency due to the fine control over the growth parameters, film-uniformity, homogeneity, the low density of pinholes to resist defects, and stable optical properties. ,− Hence, nowadays, MS has become a state-of-the-art technique to grow pristine silica films even with large-scale capabilities. Moreover, having the ability to perform the reactive growth of these films under oxygen or any other reactive atmosphere help in controlling the film’s stoichiometry.…”