Air-oxidation of nano-multilayered CrAlSiN thin films between 800 and 1000 °C

Lee, Dong Bok; Nguyen, Thuan Dinh; Kim, Sun Kyu

doi:10.1016/j.surfcoat.2008.10.011

Cited by 57 publications

(20 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…With further annealing, the thickness of the AlO x film remained relatively constant, whereas the thickness of TiO 2 layers was observed to increase gradually. This agrees well with the previously published report on faster diffusion of Ti atoms toward the surface, compared to that of Al, which explains well the higher growth rate of TiO x compared to that of AlO x at temperatures between 900 and 1100 • C [16].…”

Section: Resultssupporting

confidence: 93%

See 1 more Smart Citation

Surface modification of TiAlSiCN coatings to improve oxidation protection

Kuptsov

Kiryukhantsev-Korneev

Sheveyko

et al. 2015

Applied Surface Science

View full text Add to dashboard Cite

Section: Resultssupporting

confidence: 93%

“…2a). Unlike Al, Si did not diffuse to the coating's surface, because Si ions are relatively immobile owing to the high-energy Si O bonding (465 kJ/mol) [16]. The SiO x phase, which was formed during oxidation, acted as an additional barrier against oxygen diffusion.…”

Section: Resultsmentioning

confidence: 99%

Surface modification of TiAlSiCN coatings to improve oxidation protection

Kuptsov

Kiryukhantsev-Korneev

Sheveyko

et al. 2015

Applied Surface Science

View full text Add to dashboard Cite

“…This oxide protects against further oxidation, blocking the diffusion of oxygen towards the coating. According to the Ellingahm diagrams, Al 2 O 3 grows slowly and is more stable than other possible oxides forms in the coatings as Cr 2 O 3 , SiO 2 and TiO 2 [25,26]. Additionally, tungsten carbide was identified as well as decomposition of AlTiN from NaCl phase into cubic TiN and hexagonal AlN phase.…”

Section: Microstructural Characterisation After Annealing In Argonmentioning

confidence: 99%

Effect of Silicon Addition on Microstructure and Mechanical Properties of Chromium and Titanium Based Coatings

Ardila-Téllez¹,

Sanchez

Téllez

2014

Fac. Ing.

View full text Add to dashboard Cite

<p>The changes in the microstructure, mechanical properties and residual stresses of AlTiN, AlTiSiN, AlCrN and AlCrSiN coatings, has been studied before and after annealing at 900 ºC and 1100 ºC, using scanning and transmission electron microscopy, along with nano-indentation and X-ray diffraction techniques. The As-deposited coatings show a columnar structure, with a crystallite size between 18 nm and 28 nm. Despite the silicon addition, no effect on the crystallite size refinement was observed.<br />However, the addition of silicon increases hardness, elastic modulus and compressive residual stresses. After annealing at 900 ºC, the crystallite size growth and the residual stress relaxes; therefore, the coating hardness decreases. At 1100 ºC, the oxide layers formed in AlTiN and AlTiSiN, which act as protective layers enhancing oxidation resistance; meanwhile, a complete oxidation of AlCrN and AlCrSiN coatings take place. The Titanium based coatings present some superior mechanical properties and oxidation resistance than the chromium based coatings at 900 ºC and 1100 ºC.</p>

show abstract

“…Therefore, Al atoms formed a protective Al 2 O 3 layer, retarding the inter-diffusion of the film components. However, the oxidation parabolic rate constant (kp) of TiO 2 is higher than that of Al 2 O 3 and Cr 2 O 3 at 900-1100°C [32,33]. TiO 2 grew at an accelerated rate on to the aluminum and chromium oxide layers after oxidation at 900°C.…”

Section: Oxidation Behavior Of Coatings At High Temperaturementioning

confidence: 99%