“…18,24,25 Compared to mechanical exfoliation and molecular beam epitaxy, CVD shows advantages in the phase engineering and possibility of wafer-scale production with low cost. 5,26,27 Previous studies have shown that almost all the available materials in the Cr–Te system can be grown by CVD, including CrTe, 27–29 Cr 2 Te 3 , 30,31 Cr 5 Te 8 , 21,26 Cr 3 Te 4 , 19 and CrTe 2 . 32 Through changing the growth parameters during CVD, the phase structure and stoichiometric ratio of Cr–Te compounds can be adjusted.…”