2013
DOI: 10.1016/j.jcrysgro.2013.06.024
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Al-enhanced N incorporation in GaNAs alloys grown by chemical beam epitaxy

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Cited by 8 publications
(3 citation statements)
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“…19 Another limitation is due to the large miscibility gap of GaN x As 1Àx , causing a spinodal decomposition driven phase separation for high N concentrations, resulting in the formation of GaN clusters. 20,21 In recent work, we showed that the use of a low aluminum (Al) concentration (o15%) significantly increases the N incorporation efficiency 22 due to the preferential formation of Al-N bonds over Ga-N bonds. [23][24][25][26][27] Furthermore, using absorption measurements, we reported that Al y Ga 1Ày N x As 1Àx alloys with an Al concentration of 15% or less follow the band anticrossing model, 28 and that with these low Al concentrations, the desired bandgap of B1 eV will be reached using less nitrogen precursor than that in GaN x As 1Àx .…”
Section: Introductionmentioning
confidence: 99%
“…19 Another limitation is due to the large miscibility gap of GaN x As 1Àx , causing a spinodal decomposition driven phase separation for high N concentrations, resulting in the formation of GaN clusters. 20,21 In recent work, we showed that the use of a low aluminum (Al) concentration (o15%) significantly increases the N incorporation efficiency 22 due to the preferential formation of Al-N bonds over Ga-N bonds. [23][24][25][26][27] Furthermore, using absorption measurements, we reported that Al y Ga 1Ày N x As 1Àx alloys with an Al concentration of 15% or less follow the band anticrossing model, 28 and that with these low Al concentrations, the desired bandgap of B1 eV will be reached using less nitrogen precursor than that in GaN x As 1Àx .…”
Section: Introductionmentioning
confidence: 99%
“…An important limitation to the growth of high quality dilute nitrides originates from the poor incorporation efficiency of N, necessitating a high nitrogen precursor flux to reach even low N concentrations (<3%). We reported in our previous studies that the addition of a low aluminium (Al) concentration (<15%) significantly increases the N incorporation efficiency and distributes the N atoms in the layer more homogeneously due to the preferential formation AlN bonds over GaN bonds . A study of the optical properties of AlGaNAs alloys also revealed that they follow the band anticrossing model and that using a low Al concentration, the desired bandgap will be reached using less N‐precursor than in GaNAs .…”
Section: Introductionmentioning
confidence: 99%
“…Due to those advantages of MOVPE technique, some attempts to improve optical quality of QW grown by MOVPE have been done. Moreover, it has been shown that the quality of sample grown by MOVPE can be comparable to MBE samples [31,[49][50][51][52][53]. However, the optical properties of dilute nitrides material have been mainly studied for structures grown by MBE.…”
Section: Introductionmentioning
confidence: 99%