2021
DOI: 10.37904/nanocon.2021.4324
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Al2O3-Ta2O5 multilayer thin films deposited by pulsed direct current magnetron sputtering for dielectric applications

Abstract: This research aims at synthesizing multilayer oxide thin films made of Al2O3 and Ta2O5 for dielectric applications. Multilayer thin films made of two, four, or eight oxide layers are synthesized by physical vapor deposition, specifically the mid-frequency pulsed direct current magnetron sputtering. The thin films are made of stoichiometric Al2O3 and Ta2O5 layers having a specific morphology observed from cross-section images obtained by scanning electron microscopy (SEM). The Al2O3 layers have a columnar struc… Show more

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