2011
DOI: 10.1007/s11426-011-4377-9
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Al2O3-TiO2 composite oxide films on etched aluminum foil fabricated by electrodeposition and anodization

Abstract: Ti species have been deposited on low-voltage etched aluminum foils by a simple electrochemical method using a Ti anode as Ti source in a Ti-free I 2 -dissolved acetone solution. After annealing at 500-600 °C in air, an Al 2 O 3 -TiO 2 composite oxide film was formed on the surface of the etched aluminum foil by anodizing galvanostatically in an ammonium adipate solution. The effects of I 2 concentration in the acetone solution, applied anode voltage, electrolysis time, and annealing temperature on the specifi… Show more

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Cited by 12 publications
(4 citation statements)
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“…The thicker is the Al-Ti composite oxide layer, the higher is the specific capacitance of the anode Al foils. This is because the Al-Ti composite oxide film is substituted for the Al 2 O 3 barrier layer, and this can increase the permittivity of the anodic oxide film [9][10][11][12][13][14][15][16][17][18]. The decrease in the specific capacitance of the specimens coated 8 times might be caused by a decrease in the effective surface area and tunnel diameter as well as an increase in the film thickness.…”
Section: Resultsmentioning
confidence: 99%
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“…The thicker is the Al-Ti composite oxide layer, the higher is the specific capacitance of the anode Al foils. This is because the Al-Ti composite oxide film is substituted for the Al 2 O 3 barrier layer, and this can increase the permittivity of the anodic oxide film [9][10][11][12][13][14][15][16][17][18]. The decrease in the specific capacitance of the specimens coated 8 times might be caused by a decrease in the effective surface area and tunnel diameter as well as an increase in the film thickness.…”
Section: Resultsmentioning
confidence: 99%
“…Various methods for coating TiO 2 films on low-voltage-etched Al foils with shallow tunnels have been utilized, such as sol-gel, electrodeposition, and hydrolysis precipitation [9][10][11][12][13]. We proposed the vacuum infiltration method to fabricate TiO 2 films on high-voltage-etched Al foils with long tunnels in a previous study [14].…”
Section: Introductionmentioning
confidence: 99%
“…5 )TiO 3 composite oxide film on tunnel-etched Al foil by the sol-gel coating method and anodization [13]. Lin et al fabricated 20 V TiO 2 -Al 2 O 3 composite oxide films on tunnel-etched Al foil by electrodeposition and anodization [14]. Park et al prepared 400 V ZrO 2 -Al 2 O 3 and Nb 2 O 5 -Al 2 O 3 composite oxide films on flat Al foil by the sol-gel coating method and anodization [15].…”
Section: Introductionmentioning
confidence: 99%
“…The routine process adopted widely is to increase specific surface area of aluminum foil by etching. Recent researches show that it is another promising approach to boosting the specific capacitance further via introducing titanium oxides into dielectric layer of aluminum electrolytic ca-pacitor after etching the foil [1][2][3][4][5][6][7][8][9][10][11]. It is proposed that the increase in specific capacitance directly depends on the concentration of titanium (Ti) (IV) in dielectric layer because titanium oxides have much higher permittivity than alumina.…”
Section: Introductionmentioning
confidence: 99%