Amorphous carbon membranes were successfully synthesized onto a SiO 2 -ZrO 2 /a-Al 2 O 3 nanoporous substrate via plasma-enhanced chemical vapor deposition (PECVD) at room temperature. PECVDderived amorphous carbon membranes exhibited molecular sieving properties, showing ideal selectivities of 23 and 1750 for He/N 2 and He/SF 6 , respectively, at 25 C. The membrane maintained high selectivity even at high temperatures as high as 200 C, indicating considerable stability of the plasma-deposited amorphous carbon layer.Membrane-based gas separation is rapidly growing in a number of applications such as hydrogen purication, carbon dioxide capture, oxygen enrichment, and hydrocarbon separation, because of their low energy requirement and low operating cost. In this context, microporous inorganic membranes such as amorphous carbon membranes have recently received considerable attention owing to their unique characteristics such as an advanced thermal stability, anti-corrosive property, solvent resistance, and super-hydrophobicity. 1,2 Amorphous carbon membranes are comprised of micropores with a range of several angstroms, which can effectively reject the permeation of relatively large molecules, thereby exhibiting excellent permselectivity. 1 For instance, Yoshimune et al. reported exible carbon hollow ber membranes derived from sulfonated poly(phenylene oxide) with an ideal H 2 /N 2 selectivity of 214 and a H 2 permeance of 3.67 Â 10 À8 mol m À2 s À1 Pa À1 at 30 C. 3 The conventional synthesis of amorphous carbon membranes is via the pyrolysis and carbonization of polymeric precursors. 1,2 In this way, to obtain acceptable permeation performance, the synthetic process requires high operating temperatures that are usually well above 500 C.Another approach that might be useful for the synthesis of amorphous carbon membranes is the use of plasma-enhanced chemical vapor deposition (PECVD), which is a commonly used technique for the deposition of thin lms. There is growing interest in utilizing PECVD to fabricate inorganic membranes that have the potential for application in molecular separation, since PECVD offers a low processing temperature (as low as room temperature) unlike the conventional methods (typically 500-600 C). 4-8 For instance, Roualdes et al. prepared polysiloxane membranes using organosilicon precursors such as hexamethyldisiloxane (HMDSO) onto cellulose ester substrates and reported that plasma-deposited membranes had higher selectivity than conventional polysiloxane membranes. 4 Kafrouni et al. used hexamethyldisilazane and ammonia as precursors and prepared silicon carbonitride membranes with a He/N 2 selectivity of 50 at 150 C. 5 Moreover, in our previous study, we demonstrated a low-temperature fabrication of organosilica membranes with excellent molecular sieving properties via a 2-step PECVD involving HMDSO/Ar-PECVD followed by HMDSO/O 2 -PECVD. 6,7 The obtained membrane showed remarkable selectivities for He/N 2 and He/SF 6 of 7800 and 27 000, respectively, at 25 C. 7 We also found that such ...