The ability to create antireflective super-omniphobic surfaces is important for various optoelectronic applications, which is still a challenge. The combination design of sub-wavelength nanoscale structures for antireflection and re-entrant structures for super-omniphobicity is an effective way to obtain super-omniphobicity and antireflection simultaneously. However, due to the inclination of droplets to strike to the bottom and the complicated craftsmanship, obtaining efficient nanoscale re-entrant superomniphobic surfaces is difficult, which limits the compatibility of antireflection and super-omniphobicity. Herein, disordered nanoscale T-shape pillars are utilized to obtain the broadband antireflection, non-iridescence, and super-omniphobicity. A simple and repetitive method is reported for large-area scalable fabrication of disordered nanoscale T-shape pillars on glass based on a maskless phase separation lithographic approach. The kinetic roles of Laplace pressure, viscous force, and saturated vapor pressure in the super-omniphobicity are demonstrated by investigating the effect of feature size, interval, area fraction and pillar height of the Tshape nanopillars, liquid surface tension, viscosity, etc. The effects of feature size, interval, and height on the antireflection and the optical behavior on the T-shape nanopillars are also investigated. Although the cap of T-shape nanopillars could bring scattering loss when light touches on the cap range with a large incident angle, broadband antireflection is still obtained. As a demonstration, Tshape nanopillars exhibiting super-omniphobicity (static water contact angle of 160 ± 1.0°and ethyl alcohol contact angle of 162 ± 0.5°), high transparency (94%), broadband antireflection (347−780 nm), and non-iridescence are obtained. Our proposed method provides a simple, rapid, and low-cost process to explore the ability of nanoscale re-entrant structures for compatibility of broadband antireflection and super-omniphobicity, with promising practical application in self-cleaning optoelectronic surfaces.