2013
DOI: 10.1088/0957-4484/25/1/014016
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All-solution-processed nonvolatile flexible nano-floating gate memory devices

Abstract: Organic semiconductors have great potential for future electronic applications owing to their inherent flexibility, low cost, light weight and ability to easily cover large areas. However, all of these advantageous material properties can only be harnessed if simple, cheap and low-temperature fabrication processes, which exclude the need for vacuum deposition and are compatible with flexible plastic substrates, are employed. There are a few solution-based techniques such as spin-coating and inkjet printing tha… Show more

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Cited by 33 publications
(19 citation statements)
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“…Graphene is widely used in various nonvolatile memories due to its planar atomic structure and superlative electronic and physical properties . Kim et al fabricated an all solution‐processable organic flexible nonvolatile memory based on a n‐type semiconductor which is abbreviated as[P(NDI2OD‐T2)] and reduced graphene oxide (rGO) as nanofloating gate. All the electrodes were fabricated with poly(3,4‐ethylene‐dioxythiophene) (PEDOT):poly(styrenesulfonate) (PSS) solution by the inkjet printing method.…”
Section: Flexible Data Storage Devices Based On Transistor Structurementioning
confidence: 99%
“…Graphene is widely used in various nonvolatile memories due to its planar atomic structure and superlative electronic and physical properties . Kim et al fabricated an all solution‐processable organic flexible nonvolatile memory based on a n‐type semiconductor which is abbreviated as[P(NDI2OD‐T2)] and reduced graphene oxide (rGO) as nanofloating gate. All the electrodes were fabricated with poly(3,4‐ethylene‐dioxythiophene) (PEDOT):poly(styrenesulfonate) (PSS) solution by the inkjet printing method.…”
Section: Flexible Data Storage Devices Based On Transistor Structurementioning
confidence: 99%
“…In this way, a memory operation can be realized and this concept has been widely used in memory devices. [12][13][14][15][16][17][18][19][20] The device fabrication is based on a shadow mask approach; a detailed step-by-step illustration can be found in Figure S12. The gate, source, and drain electrodes, as well as the organic semiconductor layer are prepared in a thermal evaporator.…”
Section: Memory Device Fabrication and Characterizationmentioning
confidence: 99%
“…In addition to excellent charge trapping capability, optical transparency is another desirable feature for OFET memory 23 24 25 26 . In general, electronic devices with optical transparency provide the advantages for transparent electronics, such as smart glass electronic devices and wearable displays.…”
mentioning
confidence: 99%