Alternating-bias assisted annealing of amorphous oxide tunnel junctions

Pappas, David P.; Field, Mark; Kopas, Cameron J.; Howard, Joel A.; Wang, Xiqiao; Lachman, Ella; Oh, Jinsu; Zhou, Lin; Gold, Alysson; Stiehl, Gregory M.; Yadavalli, Kameshwar; Sete, Eyob A.; Bestwick, Andrew; Kramer, Matthew J.; Mutus, Josh Y.

doi:10.1038/s43246-024-00596-z

Commun Mater

2024

DOI: 10.1038/s43246-024-00596-z

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Alternating-bias assisted annealing of amorphous oxide tunnel junctions

David P. Pappas,

Mark Field,

Cameron J. Kopas

et al.

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Cited by 3 publications

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Correlating aluminum layer deposition rates, Josephson junction microstructure, and superconducting qubits’ performance

Oh,

Kopas,

Cansizoglu

et al. 2025

Acta Materialia

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Correlating aluminum layer deposition rates, Josephson junction microstructure, and superconducting qubits’ performance

Oh,

Kopas,

Cansizoglu

et al. 2025

Acta Materialia

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Enhanced superconducting qubit performance through ammonium fluoride etch

Kopas,

Goronzy,

Pham

et al. 2024

Mater. Quantum. Technol.

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The performance of superconducting qubits is often limited by dissipation and two-level systems (TLS) losses. The dominant sources of these losses are believed to originate from amorphous materials and defects at interfaces and surfaces, likely as a result of fabrication processes or ambient exposure. Here, we explore a novel wet chemical surface treatment at the Josephson junction-substrate and the substrate-air interfaces by replacing a buffered oxide etch (BOE) cleaning process with one that uses hydrofluoric acid followed by aqueous ammonium fluoride. We show that the ammonium fluoride etch process results in a statistically significant improvement in median T1 by ~22% (p=0.002), and a reduction in the number of strongly-coupled TLS in the tunable frequency range. Microwave resonator measurements on samples treated with the ammonium fluoride etch after niobium deposition and etching also show ~33% lower TLS-induced loss tangent compared to the BOE treated samples. As the chemical treatment primarily modifies the Josephson junction-substrate interface and substrate-air interface, we perform targeted chemical and structural characterizations to examine materials differences at these interfaces and identify multiple microscopic changes that could contribute to decreased TLS.

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Fast ZZ -free entangling gates for superconducting qubits assisted by a driven resonator

Huang,

Kim,

Roy

et al. 2024

Phys. Rev. Applied

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Alternating-bias assisted annealing of amorphous oxide tunnel junctions

Cited by 3 publications

References 51 publications

Correlating aluminum layer deposition rates, Josephson junction microstructure, and superconducting qubits’ performance

Correlating aluminum layer deposition rates, Josephson junction microstructure, and superconducting qubits’ performance

Enhanced superconducting qubit performance through ammonium fluoride etch

Fast ZZ -free entangling gates for superconducting qubits assisted by a driven resonator

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