In this paper, a flexible approach for chip to wafer high-accurate alignment and bonding is developed using a selfassembled monolayer (SAM). In this approach, a hydrophobic SAM, FDTS (CF 3 (CF 2 ) 7 (CH 2 ) 2 SiCl 3 ), is successfully patterned by lift-off process on an oxidized silicon wafer to define the binding-sites. A certain volume of H 2 O (µ/mm 2 ) is dropped and then spread on the non-coated hydrophilic SiO 2 bindingsites for self-alignment of various microelectromechanical systems (MEMS) and IC chips by capillary force of H 2 O. Our results demonstrate that reasonably high alignment speed (in milliseconds) and excellent alignment accuracy (≤1 µm) are achieved when the difference in the measured contact angle between hydrophobic FDTS and hydrophilic binding-sites is >70°. It is also found that the hydrophilic frame at the edge of each binding-site is effective in achieving successful self-alignment, while a super fine pattern at the center of the binding-site can be used to control the bonding strength. The effects of the Au/Cr thin film pattern on self-alignment are studied and discussed in this paper to enable the application of the above approach in various MEMS-IC integration processes, especially for low-cost mass production of wireless sensor nodes.Index Terms-FDTS, large scale integration, microelectromechanical system (MEMS), self-alignment, wireless sensor node.