“…We have seen previously in literature that higher growth temperatures produce larger grained material [84]. This can be attributed to an increased diffusion co-efficient for the growth radicals.…”
Section: High Temperature Devices 421 Introductionmentioning
confidence: 71%
“…Thus, in Figure 2.28 beyond the region where SiH 3 production saturates, atomic hydrogen flux continually increases and the threshold value of atomic hydrogen flux coverage for a monolayer is reached and microcrystalline growth begins. The influence of temperature has also been intensively studied though there very few reports on successfully fabricated high temperature devices [84]. A lot of research is also going on to understand low temperature growth kinetics.…”
“…We have seen previously in literature that higher growth temperatures produce larger grained material [84]. This can be attributed to an increased diffusion co-efficient for the growth radicals.…”
Section: High Temperature Devices 421 Introductionmentioning
confidence: 71%
“…Thus, in Figure 2.28 beyond the region where SiH 3 production saturates, atomic hydrogen flux continually increases and the threshold value of atomic hydrogen flux coverage for a monolayer is reached and microcrystalline growth begins. The influence of temperature has also been intensively studied though there very few reports on successfully fabricated high temperature devices [84]. A lot of research is also going on to understand low temperature growth kinetics.…”
“…The next step was the fabrication of nc-Si:H on the nano imprinted Kapton substrates which can handle higher temperatures. Here we have used a superlattice design [64,242] to deposit nc-Si:H, with alternating layers of nc-Si:H/a-Si:H allowing independent control of crystallinity [243,244]. The solar cell with a thin ~816 nm nc-Si:H/a-Si:H absorber layer , having a 12 period structure.…”
Section: Nc-si:h Cell On Kaptonmentioning
confidence: 99%
“…The superlattice was formed by alternately cycling the RF power for 180 s at high power (30W) for nc-Si and 90 s at low power (3W) for a-Si:H respectively. Stopping the nc-Si:H growth by reducing the RF power prevents the nano-crystallites from growing and coalescing, and prevents the large angle grain boundaries that are detrimental for electronic transport [242]. Growth of the a-Si:H layer generates a new seed layer on which the next layer of nc-Si:H nucleates.…”
“…Dalal [19]. The main intention for all these material growth strategies is to make sure that the grain boundaries do not collide with each other and are carefully passivated by both a-Si and hydrogen to achieve lowest possible recombinations.…”
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