Aluminium tri-iso-propoxide: Shelf life, transport properties, and decomposition kinetics for the low temperature processing of aluminium oxide-based coatings

Nanocomposite thin film of Ag nanoparticles embedded in amorphous Al 2 O 3 on optical sensors windows: Synthesis, characterization and targeted application towards transparency and anti-biofouling

“…a-Al 2 O 3 , was deposited from ATI following a protocol reported in [20]. ATI (N98%, Acros Organics) was melted in a bubbler above 413 K and then was maintained supercooled at 373 K. It was transported to the deposition zone by bubbling 30 sccm of N 2 (regulated, as for all other gas lines by mass flow controllers) through the bubbler.…”

“…Co-deposition was performed at 723 K for 31 min to reach submicrometric thickness (ranging from 300 nm to 200 nm for Q1 to Q4 respectively, estimated by reflectometry measurements). This temperature is suitable for the deposition of both Ag NPs [17] and a-Al 2 O 3 films [20] from the two selected precursors. Prior codeposition, a thin film of pure a-Al 2 O 3 was deposited on the substrates surface with the aim to enhance the adhesion, by feeding the reactor with ATI and the dilution gas for 5 min, in the previously defined conditions.…”

Amorphous Alumina Barrier Coatings on Glass: MOCVD Process and Hydrothermal Aging

“…First, maintaining ATI at the vaporization temperature for a long-period impacts the stability of the molecule and subsequently the coating quality. [ 12 ] Second, it is diffi cult to know exactly the mass fl ow rate of the generated reactive gas. Such poorly controlled transport conditions lead to nonreproducible processes, especially for the present case when low activation energy prevails in the entire temperature range of interest, de facto resulting in mass transport limited process.…”

“…This is an author-deposited version published in : http://oatao.univ-toulouse.fr/ Eprints ID : 15772 [ 9 ] radio frequency magnetron sputtering, [ 2 ] atomic layer deposition, [ 10 ] sol-gel, [ 5 ] and metalorganic chemical vapor deposition (MOCVD). [ 7,[11][12][13] CVD is one of the most attractive techniques for the time effi cient deposition of such coatings on complexin-shape geometries with conformal coverage, i.e., uniform thickness along the surface. Composition, stoichiometry, crystallinity, and microstructure of the material can be adjusted by fi ne tuning of the MOCVD experimental parameters such as reactor design, precursor selection, reactive atmosphere, deposition temperature, and pressure.…”

“…The MOCVD of alumina from vaporized aluminum tri-isopropoxide (ATI) is very well documented. [ 7,8,[11][12][13][14][15][16] ATI yields amorphous and stoichiometric alumina coatings with a smooth and dense microstructure at 5 Torr in the temperature range 420 to 650 °C. [ 7,8,14,15 ] Higher process temperatures lead to the deposition of nanocrystallized γ -Al 2 O 3 [ 15 ] or to the homogeneous decomposition of ATI, which generates a different microstructure.…”