2017
DOI: 10.1063/1.4983008
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Aluminum multicharged ion generation from femtosecond laser plasma

Abstract: Aluminum multicharged ion generation from femtosecond laser ablation is studied. A Ti:sapphire laser (wavelength 800 nm, pulse width $100 fs, and maximum laser fluence of 7.6 J/cm 2) is used. Ion yield and energy distribution of each charge state are measured. A linear relationship between the ion charge state and the equivalent acceleration energy of the individual ion species is observed and is attributed to the presence of an electric field within the plasma-vacuum boundary that accelerates the ions. The io… Show more

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Cited by 12 publications
(6 citation statements)
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“…Applying a negative potential to a gold target was shown to increase ultraviolet line emission from the laser plasma produced by a KrF excimer laser, which was attributed to electric field enhanced recombination near the target surface. 31 We extend our previous work on Al laser MCI generation 29,32 through a combined ion TOF measurement and OES of the laser plasma. The double-layer potential generated at the plasma-vacuum interface is estimated from the deconvolution of the TOF ion signal into individual ion species.…”
Section: Introductionmentioning
confidence: 66%
“…Applying a negative potential to a gold target was shown to increase ultraviolet line emission from the laser plasma produced by a KrF excimer laser, which was attributed to electric field enhanced recombination near the target surface. 31 We extend our previous work on Al laser MCI generation 29,32 through a combined ion TOF measurement and OES of the laser plasma. The double-layer potential generated at the plasma-vacuum interface is estimated from the deconvolution of the TOF ion signal into individual ion species.…”
Section: Introductionmentioning
confidence: 66%
“…This increasing trend is due to more laser energy deposition and enhanced collision efficiency of ejected species [3]. The energy distribution of ions is highly dependent on the laser intensity.…”
Section: Kinetic Energy (Ke) Measurements Of Ag Plasma Ionsmentioning
confidence: 99%
“…LIP is one of the best sources of electrons, ions and x-rays [2]. High-energy ions can be used effectively in material processing [3], ion implantation [4], surface modification [5] and thin-film deposition [6]. The laser-induced ion-treated surface provides a great control towards the attainment of required material after its physical and chemical alterations for particular applications.…”
Section: Introductionmentioning
confidence: 99%
“…The formation of multiply charged ions is associated with the absorption of most of the laser radiation energy in the plasma and gradual ionization due to a decrease in the ablation rate with an increase in the laser radiation power density [13]. Creating multiply charged high-order ions is possible using ultrashort fs-pulsed laser radiation, which has a low light flux compared to short ns-pulsed laser radiation [14,15]. The time evolution of the formation of multiply charged ions under the action of ns and fs pulsed laser radiation on carbon was studied [16,17].…”
Section: Introductionmentioning
confidence: 99%