Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Abstract

The initial adsorption of MeCpPtMe3 is investigated using synchrotron-based ambient pressure x-ray photoelectron spectroscopy (XPS). The experiments are done on a native oxide-covered Si substrate. In addition, a reaction with O2 and the created Pt surface was investigated. Inspiration for the reaction studies was found from atomic layer deposition of metallic Pt, process that uses the same compounds as precursors. With time-resolved XPS, we have been able to observe details of the deposition process and especially see chemical changes on the Pt atoms during the initial deposition of the Pt precursor. The change of the binding energy of the Pt 4f core level appears to occur on a different timescale than the growth of the active surface sites. The very long pulse of the Pt precursor resulted in a metallic surface already from the beginning, which suggest chemical vapor deposition-like reactions occurring between the surface and the precursor molecules in this experiment. Additionally, based on the XPS data measured after the Pt precursor pulse, we can make suggestions for the reaction pathway, which point toward a scenario that leaves carbon from the MeCpPtMe3 precursor on the surface. These carbon species are then efficiently removed by the subsequent coreactant pulse, leaving behind a mostly metallic Pt film.