“…at high R values [13,38,41]. The route in which ammonia and carbon dioxide act as etchants can be described as follows: in the case of nitrogen rich coatings, it is supposed that atomic hydrogen-which is formed during fragmentation of ammonia-causes etching and as a result, by increasing this ratio the deposition rate decreased drastically [33,40,42]. On the other hand, in case of oxygen rich coatings it is presumed that the number of film-forming hydrocarbon species is decreased when the number of oxygen intermediate species increases [43].…”