Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition

Abstract

Articles you may be interested inInfluence of radio frequency power on thermal diffusivity of plasma enhanced chemical vapor deposition-grown hydrogenated amorphous carbon thin-films Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution Structure of nitrogenated carbon films prepared from acetylene and nitrogen mixture in electron cyclotron resonance plasma Evaluation of the ion bombardment energy for growing diamondlike carbon films in an electron cyclotron resonance plasma enhanced chemical vapor deposition Amorphous hydrogenated carbon thin films have been deposited from benzene vapor in an electron cyclotron resonance plasma-enhanced chemical vapor deposition reactor. The effects of gas flow rate, pressure, and microwave power on deposition rates, chemical structure and composition, and on film density were investigated. Plasma enhanced dissociation and ionization reactions were monitored by mass spectrometry and by optical emission spectroscopy. Dissociation products included a variety of unsaturated hydrocarbon species ͑primarily ethylene͒ and hydrogen. Deposited films were characterized by Fourier transform infrared spectroscopy, Raman spectroscopy, and fluorescence spectroscopy. Films displayed a condensed, aromatic, hydrocarbon-like structure, albeit without extensive conjugation. Possible reaction sequences leading to the observed film structures have been proposed.