Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure

Effect of substrate temperature on the properties of carbon-coated optical fibers prepared by plasma enhanced chemical vapor deposition

“…Recently, a-C:H films for hermetic optical fiber coatings prepared by rf-PECVD using methane (CH 4 ) and hydrogen (H 2 ) as the precursor gases were studied [7,10]. When the carbon films were prepared by the rf-PECVD method, the characteristics of the films were affected by many factors such as the mixture ratio of reactive gases, self-bias voltage, substrate temperature, and so on [10,14,[16][17][18]. However, we have found no evidence of preview work to study the effect of substrate temperature on the properties of carbon-coated optical fibers prepared by rf-PECVD method.…”

Conversion of a plasma enhanced chemical vapor deposited silicon–carbon–nitride thin film at ultra-low temperature by oxygen plasma

“…Then, each half is measured for surface roughness by AFM. The RMS roughness for the as-deposited SiCN is very low (0.20 nm) and is characteristic of plasma deposited carbon-rich films [14][15][16][17]. Likewise, the plasma oxidized sample shows an equivalent roughness value of 0.18 nm.…”

DLC–ceramic multilayers for automotive applications

“…The DLC deposition with hydrocarbon gases has been studied by several authors [33][34][35][36][37] as a route to optimize DLC quality and growth rate. In this study the DLC was fabricated in an Ar + 7.5% CH 4 .…”