Amorphous Thin Film Deposition

Nazabal, Virginie; Němec, Petr

doi:10.1007/978-3-319-93728-1_37

Cited by 3 publications

(1 citation statement)

References 135 publications

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“…For the fabrication of Ge-Sb-Te thin films, different deposition techniques such as thermal (flash) evaporation [12,13], pulsed laser deposition [14,15], chemical vapor deposition using metal-organic precursors [16,17] or atomic layer deposition [18] can be exploited. Another, widely used deposition technique is magnetron sputtering which is considered as a method preserving well the stoichiometry of the target material during the deposition process and producing thin films with good adherence as well as good homogeneity and uniformity for industrial processes [19,20]. Radio-frequency (RF) cosputtering technique brings specifically advantage of deposition thin films with various compositions by only adjusting electrical power ratio applied on individual cathodes, making this method cost-effective for compositional studies of materials' properties [21].…”

Section: Introductionmentioning

confidence: 99%

Radio-frequency magnetron co-sputtered Ge-Sb-Te phase change thin films

Bouška

Nazabal

Gutwirth

et al. 2021

Journal of Non-Crystalline Solids

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Section: Introductionmentioning

confidence: 99%

Radio-frequency magnetron co-sputtered Ge-Sb-Te phase change thin films

Bouška

Nazabal

Gutwirth

et al. 2021

Journal of Non-Crystalline Solids

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Supporting plasma processes for fabrication of n-doped nano-crystalline silicon thin film on low-cost glass substrates

Bui

Huynh

et al. 2021

Vacuum

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Optimizing the Surface Properties of Zirconium Implants with Germanium Coating

Mohammed

Jassim

2023

JBBBE

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Background: zirconium (Zr) implants are known for having an aesthetically pleasing tooth-like colour Unlike the grey cervical collar that develops over time when titanium (Ti) implants are used in thin gingival biotypes. However, the surface qualities of Zr implants can be further improved. This present study examined using thermal vapour deposition (TVD) to coat Zr implants with germanium (Ge) to improve its physical and chemical characteristics and enhance soft and hard tissue responses. Materials and methods: Zr discs were divided into two groups; the uncoated (control) group was only grit-blasted with alumina particles while the coated (experimental) group was grit-blasted then coated with Ge via TVD. Field emission scanning electron microscopy (FESEM), energy-dispersive X-ray (EDX) spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle test, and cross-hatch adhesion tests were then used for surface characterization Results: An XRD analysis of the Ge-coated Zr samples revealed the substrate while the FESEM results revealed a continuous coating with no cracks. The mean surface roughness and hydrophilicity of the Ge-coated Zr substrate was significantly higher than that of the uncoated Zr substrate (P≤0.01). The cross-hatch adhesion of all the samples was 0%, thereby indicating good coating adhesion. Conclusion: Therefore Coating Zr implants with Ge via TVD enhances its physical and chemical properties.

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Amorphous Thin Film Deposition

Cited by 3 publications

References 135 publications

Radio-frequency magnetron co-sputtered Ge-Sb-Te phase change thin films

Radio-frequency magnetron co-sputtered Ge-Sb-Te phase change thin films

Supporting plasma processes for fabrication of n-doped nano-crystalline silicon thin film on low-cost glass substrates

Optimizing the Surface Properties of Zirconium Implants with Germanium Coating

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