2018
DOI: 10.1088/1742-6596/1052/1/012016
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Amorphous Thin Film for Thermoelectric Application

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Cited by 5 publications
(3 citation statements)
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“…Among potential thermoelectric materials, oxides are currently being intensively studied owing to their good chemical and thermal stability, low toxicity, high abundance and excellent transparency. Zinc oxide (ZnO) is one of the most studied n-type transparent semiconductor oxides, as its electronic properties can easily be tuned by controlling the defect densities [3][4][5][6][7][8][9]. ZnO thin films can be deposited by a wide variety of fabrication techniques, such as atomic layer deposition [10][11][12][13][14][15], pulsed laser deposition [16], sputtering [17] and solution-based processes [18][19].…”
Section: Introductionmentioning
confidence: 99%
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“…Among potential thermoelectric materials, oxides are currently being intensively studied owing to their good chemical and thermal stability, low toxicity, high abundance and excellent transparency. Zinc oxide (ZnO) is one of the most studied n-type transparent semiconductor oxides, as its electronic properties can easily be tuned by controlling the defect densities [3][4][5][6][7][8][9]. ZnO thin films can be deposited by a wide variety of fabrication techniques, such as atomic layer deposition [10][11][12][13][14][15], pulsed laser deposition [16], sputtering [17] and solution-based processes [18][19].…”
Section: Introductionmentioning
confidence: 99%
“…Among potential TE materials, oxides are currently being intensively studied owing to their good chemical and thermal stability, low toxicity, high abundance, and excellent transparency. Zinc oxide (ZnO) is one of the most studied n-type transparent semiconductor oxides, as its electronic properties can easily be tuned by controlling the defect densities. ZnO thin films can be deposited by a wide variety of fabrication techniques, such as atomic layer deposition (ALD), pulsed laser deposition, sputtering, and solution-based processes. , However, when doped ZnO thin films are desired, it would be best to conduct both the deposition and doping in a single step to minimize cost, exposure to contamination, processing time, and effort. Considering these, ALD is the ideal technique, as deposition and doping can be conducted simultaneously by simply varying the precursors being pulsed.…”
Section: Introductionmentioning
confidence: 99%
“…Thin-film oxides are a primary building block in many devices and have a wide range of applications, such as optoelectronics, spin-electronics, energy harvesting and storage, memristive devices, and optical coatings [1][2][3][4][5][6][7].…”
mentioning
confidence: 99%