“…Among potential TE materials, oxides are currently being intensively studied owing to their good chemical and thermal stability, low toxicity, high abundance, and excellent transparency. Zinc oxide (ZnO) is one of the most studied n-type transparent semiconductor oxides, as its electronic properties can easily be tuned by controlling the defect densities. − ZnO thin films can be deposited by a wide variety of fabrication techniques, such as atomic layer deposition (ALD), − pulsed laser deposition, sputtering, and solution-based processes. , However, when doped ZnO thin films are desired, it would be best to conduct both the deposition and doping in a single step to minimize cost, exposure to contamination, processing time, and effort. Considering these, ALD is the ideal technique, as deposition and doping can be conducted simultaneously by simply varying the precursors being pulsed.…”