Amylopectin-based Eco-friendly Photoresist Material in Water-developable Lithography Processes for Surface Micropatterns on Polymer Substrates

Abstract

Photoresist materials are also used in semiconductor manufacturing and have excellent properties for fine processing. In recent years, lithography technology has enabled microscopic processing. Among them, photoresist materials, which are also used in semiconductor manufacturing, are attracting attention for their potential to contribute to the development of biosensors, bioelectronics, and biotechnology in the life science field. However, photoresist materials use organic compounds in the casting solvent and developing solution, which raises concerns about environmental protection and health and safety. Therefore, it has been difficult to apply them to the life science field. In this study, we used amylose and amylopectin sugar chains to create a photoresist material that can be developed in water without using organic compounds. This material is characterized by its ability to be applied and developed with water and processed without the use of organic compounds. The photoresist patterns were fabricated and surface shapes were observed, achieving a fine fabrication of approximately 8 µm.