“…As a new emerging ultrawide band gap semiconductor, gallium oxide (Ga 2 O 3 ) possesses a large band gap of 4.9 eV, a high breakdown field of 8 MV/cm, and a desirable Baliga’s figure of merit of 3214. Additionally, it exhibits strong bonding structures with Ga- and O-displacement energies of 25 and 28 eV, respectively. , These excellent material characteristics enable Ga 2 O 3 to find extensive applications in electronic and optoelectronic devices, even comparable with GaN and SiC. , In recent years, numerous successful device demonstrations of Ga 2 O 3 , such as deep-ultraviolet photodetectors, − resistive random access memories, , gas sensors, light-emitting diodes, photocatalysts, Schottky diodes, heterojunction diodes, and metal oxide semiconductor field effect transistors for power devices, − have been explored and investigated experimentally. In all examples, the performance of these devices is highly dependent on the material merit of Ga 2 O 3 .…”