An efficient and low-cost compensation method for exposure uniformity based on digital oblique scanning lithography

Abstract

We proposed an efficient and low-cost compensation method for improving exposure uniformity. A flexible designed uniformity grayscale template compensation strategy based on digital micromirror device (DMD) oblique scanning lithography was developed, which can effectively improve exposure region uniformity. In order to avoid the asynchronous error of exposure process, the light-source synchronization control based on pulse width modulation (PWM) strategy was introduced in the lithography system. The experimental results showed that the maximum dimensional difference is decreased from 20.7% to 3.3% by the above strategy. The presented method will have a broad application prospect in printed circuit board (PCB) manufacturing field.

Edge smoothness enhancement of digital lithography based on the DMDs collaborative modulation

“…Recently, various exposure methods have been proposed to improve the fidelity of the lithography pattern. For flexibly fabrication large-area microstructures, a digital oblique scanning lithography strategy is proposed to enhance the lithography pattern quality [17][18][19][20][21][22][23]. A DMD-based lithography method using wobulation technique [24,25] is presented to improve the edge smoothness of the lithography pattern to a certain extent, which implements a static exposure by the motorized stage vibration.…”

Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography

“…However, MOPL is not prominent in achieving high resolution, though much effort has been made to enhance the patterning precision. [22][23][24][25][26] The employment of fs laser and high-numerical aperture (NA) objective lens to MOPL could simultaneously realize largearea micro-nano structures with high resolution, high efficiency and high flexibility. [27][28][29][30] The critical dimension is a crucial standard to evaluate fabrication capability.…”