2012
DOI: 10.1002/adfm.201103170
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An Electrical Rectifier Based on Au Nanoparticle Array Fabricated Using Direct‐Write Electron Beam Lithography

Abstract: Close‐packed arrays of Au nanoparticles are produced in patterned regions by electron beam (e‐beam) lithography using a highly sensitive direct–write resist, N+AuCl4−(C8H17)4Br. While the e–beam causes dewetting of the resist to nucleate Au nanoparticles, the following step of thermolysis aids particle growth and removal of the organic part. Thus formed arrays contain Au nanoparticles. Such arrays are patterned into ≈10 μm wide stripes between Au contact pads on SiO2/Si substrates to realize electrical rectifi… Show more

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Cited by 10 publications
(9 citation statements)
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“…For example, the rectification of Au‐nanoparticle‐based electrical rectifiers will be variable over 10 Hz. [ 42 ] Single In x Ga 1− x As nanowire/P‐Si heterojunction‐based nanorectifier diode worked only under 1 Hz. [ 43 ] An all‐organic diode was reported to be working under 5 Hz.…”
Section: Resultsmentioning
confidence: 99%
“…For example, the rectification of Au‐nanoparticle‐based electrical rectifiers will be variable over 10 Hz. [ 42 ] Single In x Ga 1− x As nanowire/P‐Si heterojunction‐based nanorectifier diode worked only under 1 Hz. [ 43 ] An all‐organic diode was reported to be working under 5 Hz.…”
Section: Resultsmentioning
confidence: 99%
“…In the past decades, sustained research effort has been devoted to developing novel nanofabrication technologies that permit the rational design and precise control of metallic configurations from 0D to 3D. To date, several technologies, such as chemical synthesis, self‐assembly, optical/electron‐beam lithography, focused ion beam, and 3D printing, have demonstrated distinct advantages and revealed great potential for the flexible nanostructuring of metals. However, all of these technologies suffer from insuperable problems in fabricating arbitrary 3D metallic micro/nanostructures.…”
Section: Introductionmentioning
confidence: 99%
“…Self‐assembly approaches provide a controllable avenue to construct 2D and 3D micro/nanostructures by making full use of the interactions between individual nano‐building‐blocks, but the assembly process cannot be predesigned freely. To construct metallic structures according to design, lithography techniques have been widely adopted for fabricating 2D metal patterns, and the resolution can currently reach a few nanometers; nevertheless, lithography strategies are naturally 2D processing routes and are not capable of 3D fabrication. Recently, 3D‐printing technology has made it possible to construct 3D metallic structures on a macroscopic scale .…”
Section: Introductionmentioning
confidence: 99%
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“…However, their low productivity and high cost are barriers to pattern such structures. [10][11][12][13] Among the many fabrication techniques developed for producing nanopatterned surfaces, soft lithography using PDMS has been extensively employed as a robust, inexpensive, and simple method to replicate nano/micro structures. 14 In recent years, soft lithography has emerged as promising and inexpensive technique to pattern functional, metallic, ceramic and polymeric structures with a good pattern transfer between the mould and patterned structures.…”
Section: Introductionmentioning
confidence: 99%