2017
DOI: 10.1002/anie.201703491
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An Electrochemically Treated BiVO4 Photoanode for Efficient Photoelectrochemical Water Splitting

Abstract: BiVO 4 films with (040) facet grown vertically on fluorine doped SnO 2 (FTO) glass substrates are prepared by as eed-assisted hydrothermal method. As imple electrochemical treatment process drastically enhances the photocatalytic activity of BiVO 4 ,e xhibiting ar emarkable photocurrent density of 2.5 mA cm À2 at 1.23 Vv s. reversible hydrogen electrode (RHE) under AM 1.5 Gi llumination, which is approximately 10-fold higher than that of the pristine photoanode.Loading cobalt borate (CoBi)ascocatalyst, the pho… Show more

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Cited by 431 publications
(292 citation statements)
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“…The intrinsic defects, V O , coulombically drag down the polaron hopping speed and increase the recombination probability, and thus are very unfavorable to the charge separation inside BiVO 4 needed for efficient PEC water splitting. The presently available synthesis for the porous BiVO 4 films is based on a solid‐state reaction, and thus the external dioxygen is difficult to diffuse through the solids to reach the reaction sites . To solve this problem, we developed an internal oxidant route, namely, by using an oxidative precursor, BiOIO 3 , in lieu of BiOI to synthesize nanoporous BiVO 4 films.…”
Section: Resultsmentioning
confidence: 59%
“…The intrinsic defects, V O , coulombically drag down the polaron hopping speed and increase the recombination probability, and thus are very unfavorable to the charge separation inside BiVO 4 needed for efficient PEC water splitting. The presently available synthesis for the porous BiVO 4 films is based on a solid‐state reaction, and thus the external dioxygen is difficult to diffuse through the solids to reach the reaction sites . To solve this problem, we developed an internal oxidant route, namely, by using an oxidative precursor, BiOIO 3 , in lieu of BiOI to synthesize nanoporous BiVO 4 films.…”
Section: Resultsmentioning
confidence: 59%
“…The Ar plasma treated sample exhibits two semi‐circles, indicating additional interface is formed. The series resistance ( R s ) stands for the impedance between FTO and photoanode, and charge transfer resistance R p1 and R p2 represent the impedance at the interface between SnS 2 /SnS and the photoanode/electrolyte, respectively . The SnS 2 ‐P displays a smaller radius under the light illumination, further confirming the positive role of O−S bond played in the charge transfer.…”
Section: Resultsmentioning
confidence: 84%
“…Typically, the calculated τ d values for BV/CoPy/FN‐H and BV/FN‐H are 0.92 and 1.00 ms, respectively, which indicates that the BV/CoPy/FN‐H photoanodes show a higher charge‐transfer rate than that of BV/FN‐H because the “setter” (e.g., CoPy) accelerates the hole transfer from BV to the OEC surface. The τ d value of R‐BV/CoPy/FN‐H is 68 % that of BV/CoPy/FN‐H, thus showing accelerated charge transport kinetics during PEC water oxidation, which may be related to increased carrier density as a result of the introduction of oxygen vacancies …”
Section: Figurementioning
confidence: 97%