The surface-induced and electron-induced chemistry of trifluoroiodomethane (CF3I), a potential replacement
for chlorofluorocarbons (CFCs) and chlorofluorobromocarbons (halons), were investigated under ultrahigh
vacuum conditions (p ∼ 1 × 10-10 Torr) on Mo(110). Results of temperature-programmed desorption (TPD)
experiments indicate that dissociative adsorption of CF3I leads only to nonselective decomposition on Mo(110), in contrast to reactions of CF3I on other metal surfaces. Desorption of CF3 radicals and atomic iodine
was detected mass spectrometrically during low-energy (10−100 eV) electron irradiation of four monolayer
thick films of CF3I condensed at 100 K. Results of postirradiation temperature-programmed desorption
experiments were used to identify CF2I2, C2F5I, C2F6, C2F4I2, and CFI3 as electron-induced reaction products
of CF3I. Except for CFI3, all of these electron-induced reaction products of CF3I have been previously identified
in γ-radiolysis studies, supporting our earlier claim that temperature-programmed desorption experiments
conducted following low-energy electron irradiation of multilayer thin films provide an effective method to
investigate the effects of high-energy radiation, including radical−radical reactions.