2017
DOI: 10.1016/j.microrel.2016.12.007
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An enhanced MOSFET threshold voltage model for the 6–300 K temperature range

Abstract: An enhanced MOSFET threshold voltage model for the 6-300 K temperature range. Microelectronics Reliability, 69 pp. 36-39.

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Cited by 30 publications
(27 citation statements)
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“…However, this field-assisted process of ionization (e.g., Poole-Frenkel [12]) happens in early depletion and is already completed near the surface before reaching the on-set of strong inversion where V T is evaluated. This process can thus be possibly neglected in V T and is not a justification for fitting parameters as done in [10].…”
Section: ) Incomplete Ionization (Field)mentioning
confidence: 99%
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“…However, this field-assisted process of ionization (e.g., Poole-Frenkel [12]) happens in early depletion and is already completed near the surface before reaching the on-set of strong inversion where V T is evaluated. This process can thus be possibly neglected in V T and is not a justification for fitting parameters as done in [10].…”
Section: ) Incomplete Ionization (Field)mentioning
confidence: 99%
“…To arrive at the most accurate model for V T , incomplete ionization of the dopants and other low-temperature phenomena need to be taken into account by starting from the physics. While many models have been proposed so far for the V T at low temperature, they are either semi-empirical, validated only down to moderate cryogenic temperature, or not accounting for the various physical phenomena contributing to the temperature dependence of V T [7]- [10]. For instance, the physics-based model from Jaeger and Fox [8] is valid down to 77 K and does not account for the dopant freezeout.…”
Section: Introductionmentioning
confidence: 99%
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“…which is difficult to accurately express by analytical formula. Gate-controlled diodes have been frequently used to characterize leakage current components and extract minority carrier lifetime [16] [24]. Some detailed leakage current analyses with gate-controlled diodes have been performed in regular thickness wafer for a radiation detector [16].…”
Section: Noise Optimization Of the Csa Circuitmentioning
confidence: 99%
“…Gate-controlled diodes have been frequently used to characterize leakage current components and extract minority carrier lifetime [16] [24]. Some detailed leakage current analyses with gate-controlled diodes have been performed in regular thickness wafer for a radiation detector [16]. This research, presents the ENC as a function of the detector capacitor and the feedback for a fixed value of W and L, according to the adopted CMOS process.…”
Section: Noise Optimization Of the Csa Circuitmentioning
confidence: 99%