2012
DOI: 10.1002/xrs.2398
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An etched multilayer as a dispersive element in a curved‐crystal spectrometer: implementation and performance

Abstract: Etched multilayers obtained by forming a laminar grating pattern within interferential multilayer mirrors are used in the soft x-ray range to improve the spectral resolution of wavelength dispersive spectrometers equipped with periodic multilayers. We describe the fabrication process of such an etched multilayer dispersive element, its characterizationthrough reflectivity measurement and simulations, and its implementation in a high-resolution Johann-type spectrometer. The specially designed patterning of a Mo… Show more

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Cited by 10 publications
(13 citation statements)
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“…Due to the low refractive index contrast, the total ML stack generally consists of up to hundreds of bi-layers, resulting in total ML stack heights of ≥ 1 μm. For single-order LMG operation, the required lamel aspect-ratios are in the order of ≥ 10:1, which is well above previously achieved values of ∼ 5:1 [71]. As these structures are used as optical elements, the fabrication should not negatively affect the optical behavior and consequently leave the nanoscale layered arrangement intact.…”
Section: Fabrication Of Gratings In W/si Multilayer Mirrors 41 Introsupporting
confidence: 62%
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“…Due to the low refractive index contrast, the total ML stack generally consists of up to hundreds of bi-layers, resulting in total ML stack heights of ≥ 1 μm. For single-order LMG operation, the required lamel aspect-ratios are in the order of ≥ 10:1, which is well above previously achieved values of ∼ 5:1 [71]. As these structures are used as optical elements, the fabrication should not negatively affect the optical behavior and consequently leave the nanoscale layered arrangement intact.…”
Section: Fabrication Of Gratings In W/si Multilayer Mirrors 41 Introsupporting
confidence: 62%
“…Using the developed process, LMGs with a grating period of only 200 nm and a lamel width of only 60 nm were fabricated in a ML mirror consisting of 400 W/Si bi-layers with a 2.5 nm bi-layer period. The resulting lamel aspect-ratio was 17:1 as compared to previously reported values of ∼5:1 [71]. Etching of the ML was performed using Bosch Deep Reactive Ion Etching (DRIE), which provides directional etching, but also results in typical sidewall scalloping.…”
Section: Discussionmentioning
confidence: 68%
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“…Such a 02001-p. 6 UVX 2012 grating has been designed by our team. The diffraction efficiency at the zero th order of a similar grating fabricated in the same conditions has been measured at 182 eV versus the glancing angle at the BEAR beamline of the ELETTRA synchrotron facility [17].…”
Section: Eigenstate Solutions Of the CM Equationsmentioning
confidence: 99%
“…This latter point is important from the practical point of view; indeed recent measurements of the efficiency at the zero th order of a Mo/B 4 C MG [17] have shown that the absolute peak efficiency is smaller and that the bandwidth is notably larger than the expected ones for a perfect LMG as given by the modal theory. One can suspect that these discrepancies can be attributed, at least in part, to a departure of the multilayer pitch from the rectangular shape.…”
Section: Introductionmentioning
confidence: 97%