“…This technique spread throughout the MEMS community and formed the basis for many other novel electromechanical structures. The planar lithography approach has evolved over the years to include integrated interconnects 38 , active electronics 35,39,40 , cochlear implants 41,42 , polytrodes 31 , and three-dimensional arrays 29,[43][44][45] . An important simplification for defining and releasing fine neural probe structures has been the use of silicon-on-insulator (SOI) wafers and deep reactive ion etching (DRIE) 46,47 that many groups have adopted.…”