An improved bilayer PMGI(1) lithographic process

Guibert, J. C.; Chevallier, Michele; Paniez, Patrick Jean; Amblard, Gilles R.

doi:10.1016/0167-9317(87)90078-5

Cited by 4 publications

(5 citation statements)

References 9 publications

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“…The fabrication sequence is illustrated in Figure 3 and described below. First, a 150 nm polymethylglutarimide (PMGI) (MicroChem, Westborough, MA, USA) layer [ 33 ] was spin-coated onto the GMR film followed by a one minute UV-ozone treatment to reduce surface hydrophobicity and promote the adhesion of a 500 nm polyhydroxystyrene (PHOST) (Sigma-Aldrich, St. Louis, MO, USA) that was spin-coated next. E-beam lithography (JEOL JBX-5500FS) was used to write 1 μm × 400 nm lines into the PHOST resist [ 34 , 35 ] at a dose of 8500 μC/cm 2 , where 400 nm defines the length of the sensor (distance between the current leads) and is aligned with the hard magnetization axis in the multilayer (see above).…”

Section: Methodsmentioning

confidence: 99%

Ultrasensitive Magnetic Nanoparticle Detector for Biosensor Applications

Liang

Chang

Qiu

et al. 2017

Sensors

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Ta/Ru/Co/Ru/Co/Cu/Co/Ni80Fe20/Ta spin-valve giant magnetoresistive (GMR) multilayers were deposited using UHV magnetron sputtering and optimized to achieve a 13% GMR ratio before patterning. The GMR multilayer was patterned into 12 sensor arrays using a combination of e-beam and optical lithographies. Arrays were constructed with 400 nm × 400 nm and 400 nm × 200 nm sensors for the detection of reporter nanoparticles. Nanoparticle detection was based on measuring the shift in high-to-low resistance switching field of the GMR sensors in the presence of magnetic particle(s). Due to shape anisotropy and the corresponding demag field, the resistance state switching fields were significantly larger and the switching field distribution significantly broader in the 400 nm × 200 nm sensors as compared to the 400 nm × 400 nm sensors. Thus, sensor arrays with 400 nm × 400 nm dimensions were used for the demonstration of particle detection. Detection of a single 225 nm Fe3O4 magnetic nanoparticle and a small number (~10) of 100 nm nanoparticles was demonstrated. With appropriate functionalization for biomolecular recognition, submicron GMR sensor arrays can serve as the basis of ultrasensitive chemical and biological sensors.

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Section: Methodsmentioning

confidence: 99%

Ultrasensitive Magnetic Nanoparticle Detector for Biosensor Applications

Liang

Chang

Qiu

et al. 2017

Sensors

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“…PMGI has also been patterned using electron-beam 5,6 and proton beam exposure. 12 Because PMGI is insoluble in the casting solvents used by most Novolac photoresist formulations, [13][14][15][16][17] PMGI is often used for bilayer lift-off processes. This resist can be patterned with submicrometer feature sizes, and, depending on formulation, has a glass transition temperature between 180 and 190°C.…”

Section: Introductionmentioning

confidence: 99%

Exposure and development of thick polydimethylglutarimide films for MEMS applications using 254-nm irradiation

Foulds

Johnstone

Tsang

et al. 2008

J. Micro/Nanolith. MEMS MOEMS

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Polydimethylglutarimide ͑PMGI͒-based resists are finding increasing use in microelectromechanical systems ͑MEMS͒ as both sacrificial and structural materials. PMGI-based resists are commercially available and were originally designed for use in bilayer lift-off applications. Literature on deep-UV exposure and development of PMGI films is limited to films less than 2.5 m in thickness, and use only tetramethylammonium hydroxide ͑TMAH͒-based developers. We investigate the exposure and development of PMGI films greater than 6 m in thickness using the two main classes of developer for PMGI, TMAH, and tetraethylammonium hydroxide ͑TEAH͒-based developers. At these thicknesses, a nonuniform dose through the film due to the optical absorption of the PMGI leads to large gradients in the dissolution properties. We report etch rates as a function of surface dose and development time. Additionally a model is developed to provide a basic predictor of development depth and other important data for fabrication process planning and development.

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“…Poly͑dimethylglutarimide͒ ͑PMGI͒ is a resist that is commonly used in bilayer [1][2][3][4][5][6][7][8][9][10][11] and trilayer [12][13][14] imaging applications. For example, PMGI can be used to create lift-off profiles with thicknesses greater than 10 m. 8 In addition to being used as a resist, PMGI has also been used as an optical material in microfabricated optical devices [15][16][17] and as both a structural layer and a sacrificial layer in surface micromachining.…”

Section: Introductionmentioning

confidence: 99%

Isopropanol/water as a developer for poly(dimethylglutarimide)

Johnstone

Foulds

Pallapa

et al. 2008

J. Micro/Nanolith. MEMS MOEMS

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Poly͑dimethylglutarimide͒ ͑PMGI͒ is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol ͑IPA͒ and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose. © 2008 Society of Photo-Optical Instrumentation Engineers.

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An improved bilayer PMGI(1) lithographic process

Cited by 4 publications

References 9 publications

Ultrasensitive Magnetic Nanoparticle Detector for Biosensor Applications

Ultrasensitive Magnetic Nanoparticle Detector for Biosensor Applications

Exposure and development of thick polydimethylglutarimide films for MEMS applications using 254-nm irradiation

Isopropanol/water as a developer for poly(dimethylglutarimide)

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