An improved virtual aberration model to simulate mask 3D and resist effects

Kanaya, Reiji; Fujii, Koichi; Imai, Motokatsu; Matsuyama, Tomoyuki; Tsuzuki, Takao; Lin, Qun Ying

doi:10.1117/12.2085606

Cited by 3 publications

(2 citation statements)

References 5 publications

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“…With advanced design nodes below 45 nm the mask 3D effects have become more pronounced. It is observed that in dense structure regions using oblique illumination and an attenuated phase shifting mask (att-PSM), the intensity of zero-and first-order diffraction changes as pitch shrinks [33][34][35][36].…”

Section: Phase Shift Maskmentioning

confidence: 99%

Lithography technology for advanced devices and introduction to integrated CAD analysis for hotspot detection

Vikram

Agarwal

2017

IET Circuits, Devices & Systems

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Optical projection lithography has been the workhorse of the integrate circuit (IC) manufacturing industry to transfer the computer-aided design (CAD) to semiconducting material wafers. The resolution limit of the 193 nm wavelength lithography which was initially targeted for the 90 nm design rule has been further extended to realise ∼10-20 nm devices with ingenious interventions. The three-dimensional fin-shaped field-effect transistor device structure now realise the <20 nm design rule still using 193 nm projection lithography as the widely accepted solution. The extreme ultraviolet wavelength source systems are still in development and testing phases with some recent success reported, but still falling short of supporting volume production requirements. This study reviews the current trends in lithography and the associated resolution enhancement techniques with brief introduction to an integrated CAD analysis for hotspot detection.

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Section: Phase Shift Maskmentioning

confidence: 99%

Lithography technology for advanced devices and introduction to integrated CAD analysis for hotspot detection

Vikram

Agarwal

2017

IET Circuits, Devices & Systems

View full text Add to dashboard Cite

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“…It is observed that in dense structure regions using oblique illumination and an attenuated phase shifting mask (att-PSM), the intensity of zero and first order diffraction changes as pitch shrinks [33][34][35][36].…”

Section: Phase Shift Maskmentioning

confidence: 99%

Critical Review of Current Trends in ASIC Writing and Layout Analysis

Vikram¹,

Agarwal

2016

JSTS:Journal of Semiconductor Technology and Science

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Abstract-Electrical Designs for Application SpecificIntegrated Circuits (ASIC) has undergone a change recently with the advent of the sub-wavelength lithography. The optical projection with 193 nm wavelength has been further extended with the use of immersion and other techniques. The competing trends for printing smaller design features have been discussed in this paper with the discussion of the electrical layout analysis to find unfriendly design features. The early knowledge of the unfriendly design features allows remedial actions in time for better yield on the wafer. There are existing standard design qualification criteria being used in the design and fabrication community, but they seem to be insufficient to guarantee defect free designs. This paper proposes an integrated approach for screening the layout with multiple aspects: layout geometry based, graphical analysis and process model based verification. The results have been discussed with few example design features from the 28nm design layout.

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Transformation of the coastal social-ecological system in southwest Bangladesh due to empolderment

et al. 2022

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Initiated in the early 1960s, the Coastal Embankment Project (CEP) in Bangladesh brought more than 1.2 million hectares of low-elevation coastal land under cultivation through a complex system of embankments and drainage sluices. A significant milestone in the history of water resources management in Bangladesh, CEP catalyzed the socio-economic development of the coastal community over the following decades. However, the human intervention in the complex hydro-geo-morphological settings of the Ganges delta later manifested some challenges. As the embankments had cut off the tidal plains from the rivers, silt started depositing on the riverbeds, which eventually caused drainage congestion inside the polders. Meanwhile, significant changes in landuse occurred as saltwater shrimp farming took over traditional crop cultivation. Shrimp cultivation increased soil salinity inside the polders rendering the land unsuitable for crop cultivation. The kitchen gardens and the fruit plants that grew after the construction of the embankments disappeared from the landscape due to high soil salinity. The cyclone in 2009 badly damaged the embankments in the southwest coastal region resulting in the longstanding suffering of the people. The protected landscape became subject to tidal flooding, sweeping off the decades of development gains. This case study from Bangladesh demonstrates how physical infrastructure can significantly change the bio-physical and socio-economic landscapes in coastal settings and give rise to a new social-ecological system.

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An improved virtual aberration model to simulate mask 3D and resist effects

Cited by 3 publications

References 5 publications

Lithography technology for advanced devices and introduction to integrated CAD analysis for hotspot detection

Lithography technology for advanced devices and introduction to integrated CAD analysis for hotspot detection

Critical Review of Current Trends in ASIC Writing and Layout Analysis

Transformation of the coastal social-ecological system in southwest Bangladesh due to empolderment

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