Abstract:…………………………………………………………………………………………………….... Introduction:-In deep submicron Integrated Circuits (IC) technologies, process-induced parameter variations cause performance fluctuations, which is an important challenge to be addressed. Due to this, the traditional worst-case methodology of design is no more effective as process variations require more design margins. To deal with this problem, the prediction of parameter variations can play a vital role in manufacturability of silicon devices [1,2,3]. Lower techno… Show more
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