We investigated the effectiveness of a single gate SiGe/Si heterostructure tunnel field-effect transistor (TFET) as a photosensor in the visible spectrum. A transparent zinc oxide (ZnO) layer is used as the optical region over the channel for sensing the incident light. When light impinges on the gate catalyst and creates optical charge carriers in the illumination region, the conductance of the device considerably rises and, consequently, the subthreshold current changes. For the suggested photosensor, the effect of varying drain-to-source voltage, germanium mole fraction (x), and silicon film thickness (tsi) on the sensor performance are investigated. The sensor offers enhanced sensitivity performance as compared to the traditional TFET in terms of several optical figures of merit such as available photocurrent, responsivity, quantum efficiency, sensitivity, and SNR, and can therefore be utilized as an efficient photosensor. The reported sensor has a peak responsivity (R) of 2.23 A/W and quantum efficiency (η) of 7.31 at a wavelength (λ) of 450 nm.