A 0.5 µm thick layer of rhodium was deposited on the CMSX 4 superalloy by the electroplating method. The rhodium-coated superalloy was hafnized and aluminized or only aluminized using the Chemical vapour deposition method. A comparison was made of the microstructure, phase composition, and oxidation resistance of three aluminide coatings: nonmodified (a), rhodium-modified (b), and rhodium-and hafnium-modified (c). All three coatings consisted of two layers: the additive layer and the interdiffusion layer. Rhodium-doped (rhodiumand hafnium-doped) β-NiAl phase was found in the additive layer of the rhodium-modified (rhodium-and hafnium-modified) aluminide coating. Topologically Closed-Pack (µ and σ) phases precipitated in the matrix of the interdiffusion layer. Rhodium also dissolved in the β-NiAl phase between the additive and interdiffusion layers, whereas Hf-rich particles precipitated in the (Ni,Rh)Al phase at the additive/interdiffusion layer interface in the rhodium-and hafnium-modified coating (c). The rhodium-modified aluminide coating (b) has better oxidation resistance than the nonmodified one (a), whereas the rhodium-and hafnium-modified aluminide coating (c) has better oxidation resistance than the rhodium-modified (b) and nonmodified (a) ones.