“…Over the years, the AMC contaminants of greatest concern in photolithography applications have changed dramatically. Since the early 1990s the focus of AMC filtration has ranged from ammonia (NH3), 1,2 n-methyl-2-pyrrolidinone (NMP), 3,4 amines, 5 sulfur dioxide (SO2) 6 and acid gases in general, 7 to siloxanes (HMDS, HMDSO, and TMS). 8,9 The issues associated with these contaminants have ranged from photoresist issues (e.g.…”