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“…Poppa also considered the possibility of micromachining thin silver films by masking them with carbon films and then exposing them to ionic bombardment. Haymann and Gervais (183) described an ion etching unit designed to operate at 1 microtorr and at 1500 0 C. intended for use in electron diffraction instruments.…”
Section: Stewart Andmentioning
confidence: 99%
“…Poppa also considered the possibility of micromachining thin silver films by masking them with carbon films and then exposing them to ionic bombardment. Haymann and Gervais (183) described an ion etching unit designed to operate at 1 microtorr and at 1500 0 C. intended for use in electron diffraction instruments.…”
Section: Stewart Andmentioning
confidence: 99%
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