An optical grating filter dry-etched on a LiNbO3 substrate

Abstract

Abstract:We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO 3 using inductively coupled plasma etching with C 4 F 8 /Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices

“…However, since the electron beam is strongly influenced by the ferroelectric behavior of the material, it is not easy to form the nanostructures LN surface by EBL [7]. The authors have prepared a diffraction grating for wavelength filter waveguide formed on the LN substrate by Ti diffusion by using UV-imprint technique combined with lift-off method, and have successfully fabricated ridge-type waveguide with an insertion loss of 23 dB [8].…”